Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product

• US 6,737,662 B2
• Filed: 05/30/2002
• Issued: 05/18/2004
• Est. Priority Date: 06/01/2001
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Mulder, Heine Melle, Van Schoot, Jan Bernard Plechelmus, Van Dijsseldonk, Antonius Johannes Josephus, Eurlings, Markus Franciscus Antonius, Dierichs, Marcel
• Primary Examiner(s): LE, QUE TAN
• Application Number:
  US10/157,033
• Publication Number:
  US 20030038225A1
• Time in Patent Office: 719 Days
• Field of Search: 250/548, 250/559.3, 250/559.4, 250/216, 250/201.5, 250/205, 356/399, 356/400, 356/401, 355/53, 355/67, 355/55
• US Class Current: 250/548
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70116 Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
• CPC Class Codes: G03F 7/70141 Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
• CPC Class Codes: G03F 7/702 Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Abstract

A lithographic projection system has an illumination system. A plurality of directing elements reflect different sub-beams of an incident projection beam into adjustable, individually controllable directions. By using of re-directing optics any desired spatial intensity distribution of the projection beam can be produced in its cross-sectional plane.

Claims

1. A lithographic projection apparatus, comprising:

a radiation system constructed and arranged to provide a projection beam of radiation;

a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;

a substrate table to hold a substrate;

a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;

wherein the radiation system comprises an illumination system configured to define the intensity distribution of the projection beam, the illumination system comprises a steering device constructed and arranged to individually steer different parts of an incoming radiation beam into different directions to provide a desired angular intensity distribution of the projection beam at the patterning device, said steering device comprising a plurality of discrete reflectors, each for steering a part of the incoming beam, and whose orientation can be controlled individually to direct the corresponding part of the incoming beam into a desired direction.

2. An apparatus according to claim 1, wherein the illumination system further comprises re-directing elements to re-direct at least a part of the incoming beam and to produce a spatial intensity distribution in a cross-section of the incoming beam which corresponds to said angular intensity distribution.

3. An apparatus according to claim 2, wherein the cross-section is in a pupil plane.

4. An apparatus according to claim 2, wherein the illumination system further comprises a widening device that widens the range of directions into which the incoming beam propagates.

5. An apparatus according to claim 4, wherein the widening device comprises a diffuser device.

6. An apparatus according to claim 5, wherein the diffuser device is a diffuser plate.

7. An apparatus according to claim 1, wherein the discrete reflectors are arranged side by side to each other in a cross-sectional area of the incoming beam.

8. An apparatus according to claim 1, wherein the illumination system further comprises a concentrating device constructed and arranged to concentrate parts of the incoming beam onto the discrete reflectors.

9. An apparatus according to claim 8, wherein the concentrating device comprises a reflective surface area having one of a parabolic and a hyperbolic cross-sectional shape and an array of one of hyperbolic and parabolic reflective surfaces.

10. An apparatus according to claim 1, wherein said steering device comprises a first faceted reflector, each of the discrete reflectors being a facet of the first faceted reflector and constructed and arranged to project an image of a radiation source onto a selected facet of a second faceted reflector by control of the orientation thereof.

11. An apparatus according to claim 10, further comprising an actuator for each of said discrete reflectors constructed and arranged to change its orientation by rotation about two axes substantially perpendicular to the optical axis of that discrete reflector.

12. An apparatus according to claim 11, wherein the two axes are orthogonal.

13. An apparatus according to claim 10, wherein each facet of said second facet is also controllable in orientation.

14. An apparatus according to claim 1, wherein said steering device comprises a first faceted reflector, each of the discrete reflectors being an array of facets of the first faceted reflector, each facet of the first faceted reflector constructed and arranged to project an image of a radiation source onto a facet of a second faceted reflector.

15. An apparatus according to claim 10, wherein said second faceted reflector has more facets than said first faceted reflector.

16. An apparatus according to claim 10, wherein said second faceted reflector is located substantially in a conjugate plane of a pupil of said projection system.

17. A device manufacturing method, comprising:

providing a substrate at least partially with a layer of radiation-sensitive material;

providing at least one projection beam of radiation;

modifying the intensity distribution of the projection beam;

using a patterning device to endow the modified projection beam with a pattern in its cross-section;

projecting the patterned beam of radiation onto a target which comprises at least a part of the radiation-sensitive material, wherein the modification of the intensity distribution of the projection beam includes controlling the direction into which the radiation propagates, wherein the projection beam comprises a plurality of sub-beams, wherein at least some of the sub-beams are steered into different directions using a plurality of discrete reflectors, and wherein the discrete reflectors are individually controlled to direct the corresponding sub-beam into a desired direction.

18. A method according to claim 17, wherein a desired angular intensity distribution of radiation propagation at the patterning device is produced by steering the sub-beams, wherein the steered sub-beams contribute to a desired spatial intensity distribution of the projection beam in its cross-section, and wherein each of said different directions of radiation propagation corresponds to one particular area of the spatial intensity distribution in said cross-section.

19. A method according to claim 18, wherein the one particular area is one specific local point in a local plane.

20. A method according to claim 18, wherein at least one of the sub-beams is manipulated before it is steered so that the steered sub-beam propagates into a defined range of propagation directions.

21. A method according to claim 18, wherein the steered sub-beams each propagate essentially into a single direction.

22. A method according to claim 20, wherein the defined range of propagation directions of at least one of the steered sub-beams is increased so that the at least one steered sub-beam corresponds to an increased area of said spatial intensity distribution.

23. A computer program product comprising a computer able medium having stored thereon a computer readable program code, wherein the gram code enables the computer to perform the method according to claim 20.