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Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product

  • US 6,737,662 B2
  • Filed: 05/30/2002
  • Issued: 05/18/2004
  • Est. Priority Date: 06/01/2001
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus, comprising:

  • a radiation system constructed and arranged to provide a projection beam of radiation;

    a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;

    a substrate table to hold a substrate;

    a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;

    wherein the radiation system comprises an illumination system configured to define the intensity distribution of the projection beam, the illumination system comprises a steering device constructed and arranged to individually steer different parts of an incoming radiation beam into different directions to provide a desired angular intensity distribution of the projection beam at the patterning device, said steering device comprising a plurality of discrete reflectors, each for steering a part of the incoming beam, and whose orientation can be controlled individually to direct the corresponding part of the incoming beam into a desired direction.

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