Aerogel substrate and method for preparing the same

• US 6,740,416 B1
• Filed: 05/08/2001
• Issued: 05/25/2004
• Est. Priority Date: 11/10/1999
• Status: Expired due to Term

• Current Assignee: Panasonic Electric Works Company Limited (Panasonic Holdings Corporation)
• Original Assignee: Asahi Matsushita Electric Works Ltd. (Panasonic Holdings Corporation)
• Inventors: Tsubaki, Kenji, Sonoda, Kenji, Yokoyama, Masaru, Kawano, Kenji, Yokogawa, Hiroshi
• Primary Examiner(s): Jones, Deborah
• Assistant Examiner(s): XU, LING X
• Application Number:
  US09/830,572
• Time in Patent Office: 1,113 Days
• Field of Search: 428/446, 428/450, 428/448, 428/698, 428/209, 428/690, 428/913, 428/702, 359/356, 385/2.8, 427/255.18, 427/255.19, 427/255.28, 427/255.6, 427/255.7
• US Class Current: 428/446
• CPC Class Codes: B05D 1/202 Langmuir Blodgett films (LB films)
• CPC Class Codes: C03C 17/34 with at least two coatings having different compositions C03C17/44 takes precedence
• CPC Class Codes: C03C 17/3411 with at least two coatings of inorganic materials C03C17/36, C03C17/42 take precedence
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 17/42 at least one coating of an organic material and at least one non-metal coating
• CPC Class Codes: C03C 2217/75 Hydrophilic and oleophilic coatings
• CPC Class Codes: C03C 2217/76 Hydrophobic and oleophobic coatings
• CPC Class Codes: C03C 2218/32 After-treatment
• CPC Class Codes: C23C 14/046 Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
• CPC Class Codes: C23C 14/06 characterised by the coating material C23C14/0021 , C23C14/04 take precedence
• CPC Class Codes: C23C 16/045 Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
• CPC Class Codes: G02B 6/02042 Multicore optical fibres
• CPC Class Codes: G02B 6/122 Basic optical elements, e.g. light-guiding paths
• CPC Class Codes: H01L 33/005 Processes
• CPC Class Codes: H01L 33/0066 with a substrate not being a III-V compound
• CPC Class Codes: H01L 33/0093 Wafer bonding; Removal of the growth substrate
• CPC Class Codes: H05K 1/0306 Inorganic insulating substrates, e.g. ceramic, glass
• CPC Class Codes: H10K 50/85 Arrangements for extracting light from the devices
• CPC Class Codes: Y10S 428/913 Material designed to be responsive to temperature, light, moisture
• CPC Class Codes: Y10T 428/24917 : including metal layer

Abstract

An aerogel substrate useful for an electrically conductive substrate, a heat insulating substrate, an optical waveguide substrate, a substrate for a light emitting device or a light emitting device is provided.

The aerogel substrate is characterized by comprising a functional layer and an aerogel layer, and an intermediate layer formed between the functional layer and the aerogel layer to allow the functional layer to be formed uniformly thereon. The intermediate layer is formed on at least one surface of the aerogel layer by a gas phase method, by the Langmuir-Blodgett method or by adsorption of an inorganic layered compound; or formed by a hydrophilicizing treatment of at least one surface of the aerogel layer followed by coating and drying an aqueous coating fluid, by an annealing treatment of at least one surface of the aerogel layer, or by a hydrophilicizing treatment of at least one surface of the aerogel layer.

Claims

1. An aerogel substrate, comprising an aerogel layer, an intermediate layer formed on a surface of the aerogel layer, and a functional layer formed on a surface of the intermediate layer without penetration into the aerogel layer, wherein the functional layer is

an infrared ray reflective thin film;

an optical waveguide thin film;

a transparent and electrically conductive thin film comprising at least one member selected from the group consisting of indium-tin oxide, indium-zinc oxide, silver, and chromium;

a fluorescent layer;

or

an electrically conductive thin film;

provided that when the functional layer is an electrically conductive thin layer, then the intermediate layer is copper phthalocyanine.

2. The aerogel substrate according to claim 1, wherein the intermediate layer prevents the material which constitutes the functional layer from penetrating into the aerogel layer.

3. The aerogel substrate according to claim 2, wherein the aerogel layer comprises a hydrophobic aerogel layer, the intermediate layer comprises

a hydrophilic layer and a coating layer, wherein the hydrophilic layer is formed by subjecting a surface of the hydrophobic aerogel layer to a hydrophilicizing treatment, the coating layer is formed on a surface of the hydrophillic layer, and wherein the functional layer is formed on a surface of the coating layer.

4. The aerogel substrate according to claim 2, wherein the intermediate layer comprises at least one member selected from the group consisting of an inorganic layer or an organic layer, wherein the inorganic layer and the organic layer are formed by a gas phase method.

5. The aerogel substrate according to claim 4, wherein the inorganic layer is made of an inorganic material selected from SiO2, SiN, SiON and TiO2.

6. The aerogel substrate according to claim 2, wherein the intermediate layer is a welded layer which is formed by heating at least one surface of the aerogel layer.

7. The aerogel substrate according to claim 2, wherein the intermediate layer is a Langmuir-Blodgett film.

8. The aerogel substrate according to claim 2, wherein the intermediate layer comprises at least one inorganic layer.

9. The aerogel substrate according to claim 1, wherein the aerogel layer is a hydrophobic aerogel layer, the intermediate layer is a hydrophilic layer which is formed by subjecting a surface of the hydrophobic aerogel layer to a hydrophilicizing treatment, and the functional layer is formed on a surface of the hydrophilic layer.

10. The aerogel substrate according to claim 1, wherein the aerogel is a silica aerogel.

11. The aerogel substrate according to claim 1, wherein the aerogel layer is formed on a plate member.

12. The aerogel substrate according to claim 1, wherein the functional layer comprises at least one member selected from the group consisting of aluminum-quinolinol, Y₂O₃:

Eu, LaPO₄;

Ce, Tb, and BaMGAL₁₀O₁₇;

Eu.

13. A process for producing the aerogel substrate according to claim 3 comprising the steps of

forming a hydrophilic layer by subjecting at least one surface of an aerogel layer to a plasma treatment or a UV ozone treatment;

and

forming a functional layer by coating a surface of the hydrophilic layer with an aqueous solution and/or an aqueous dispersion of a film-forming component followed by drying the solution and/or the dispersion.

14. The process according to claim 13, wherein the aerogel is a silica aerogel.

15. The process according to claim 13 wherein the functional layer is formed by a coating method or gas phase method.

16. A process for producing an aerogel substrate having a functional layer on at least one surface thereof comprising the steps of:

forming an intermediate layer on at least one surface of an aerogel layer; and

forming a functional layer on a surface of the intermediate layer,

said intermediate layer being a layer which prevents a material which constitutes the functional layer from penetrating into the aerogel layer, wherein the functional layer is

an infrared ray reflective thin film;

an optical waveguide thin film;

a transparent and electrically conductive thin film comprising at least one member selected from the group consisting of indium-tin oxide indium-zinc oxide, silver, and chromium;

a fluorescent layer;

or an electrically conductive thin film;

provided that when the functional layer is an electrically conductive thin layer, then the intermediate layer is copper phthalocyanine.

17. The process according to claim 16, wherein forming the intermediate layer comprises the steps of:

forming a hydrophilic layer by subjecting at least one surface of a hydrophobic aerogel layer to a plasma treatment or a UV ozone treatment; and

forming a coating layer by coating a surface of the hydrophilic layer with an aqueous solution and/or an aqueous dispersion of a film-forming component followed by drying the solution and/or the dispersion.

18. The process according to claim 16, wherein the step of forming the intermediate layer comprises the step of forming an inorganic layer or an organic layer by a gas phase method on at least one surface of the aerogel layer.

19. The process according to claim 18, wherein the gas phase method is selected from a CVD method, a sputtering method and a vapor deposition method.

20. The process according to claim 16, wherein the step of forming the intermediate layer comprises the step of forming a welded layer by heating at least one surface of the aerogel layer.

21. The process according to claim 16, wherein the step of forming the intermediate layer comprises the step of forming a thin film on at least one surface of the aerogel layer by the Langmuir-Blodgett method.

22. The process according to claim 16, wherein the step of forming the intermediate layer comprises the step of forming an inorganic layered compound layer by having at least one surface of an aerogel layer adsorb an inorganic layered compound.

23. The process according to claim 16, wherein the aerogel is a silica aerogel.

24. The process according to claim 16, wherein the functional layer is formed by a coating method or a gas phase method.

25. The process according to claim 16, wherein the functional layer comprises at least one member selected from the group consisting of aluminum-quinolinol, T₂O₃:

Eu, LaPO₄;

Ce, Tb, and BaMGAL₁₀O₁₇;

Eu.