Semiconductor device and manufacturing method thereof

• US 6,740,939 B2
• Filed: 03/19/2002
• Issued: 05/25/2004
• Est. Priority Date: 05/02/2001
• Status: Expired due to Fees

• Current Assignee: Renesas Electronics Corporation
• Original Assignee: Renesas Technology Corporation (Renesas Electronics Corporation)
• Inventors: Oda, Hidekazu, Ohta, Kazunobu, Sayama, Hirokazu, Nishida, Yukio
• Primary Examiner(s): Nelms, David
• Assistant Examiner(s): Vu, David
• Application Number:
  US10/100,090
• Publication Number:
  US 20020164858A1
• Time in Patent Office: 798 Days
• Field of Search: 257/371-372, 257/375-376, 257/396, 257/500, 257/550, 257/553, 438/199-200, 438/282, 326/45, 326/50, 327/542-543, 327/546, 327/566
• US Class Current: 257/371
• CPC Class Codes: H01L 21/823807 with a particular manufacturing method of the channel structures, e.g. channel implants, halo or pocket implants, or channel materials
• CPC Class Codes: H01L 21/823842 gate conductors with different gate conductor materials or different gate conductor implants, e.g. dual gate structures
• CPC Class Codes: H01L 21/823857 with a particular manufacturing method of the gate insulating layers, e.g. different gate insulating layer thicknesses, particular gate insulator materials or particular gate insulator implants

Abstract

CMOS transistors which can satisfy demand for size reduction and demand for reliability and a manufacturing method thereof are provided. A buried-channel type PMOS transistor is provided only in a CMOS transistor (100B) designed for high voltage; surface-channel type NMOS transistors are formed in a low-voltage NMOS region (LNR) and a high-voltage NMOS region (HNR), and a surface-channel type PMOS transistor is formed in a low-voltage PMOS region (LPR).

Claims

1. A semiconductor device, comprising:

a first NMOS transistor and a first PMOS transistor provided respectively in a first NMOS region and a first PMOS region defined in a surface of a semiconductor substrate; and

a second NMOS transistor and a second PMOS transistor provided respectively in a second NMOS region and a second PMOS region defined in the surface of said semiconductor substrate;

said second NMOS transistor and said second PMOS transistor having higher operating voltages respectively than said first NMOS transistor and said first PMOS transistor,

said second PMOS transistor being a buried-channel type MOS transistor in which a channel is formed in the inside of said semiconductor substrate, and

said first NMOS transistor, said first PMOS transistor, and said second NMOS transistor being surface-channel type MOS transistors in which a channel is formed in the surface of said semiconductor substrate.

2. The semiconductor device according to claim 1, wherein said second PMOS transistor comprises,

a gate insulating film selectively provided on the surface of said semiconductor substrate in said second PMOS region,

a gate electrode provided on said gate insulating film,

a P-type impurity layer of a relatively low concentration provided in the surface of said semiconductor substrate right under said gate insulating film, and

a pair of P-type source/drain layers provided in the surface of said semiconductor substrate outside of sides of said gate electrode and in contact with said impurity layer.

3. The semiconductor device according to claim 2, wherein said pair of P-type source/drain layers comprise a pair of P-type extension layers extending from opposing ends and facing each other.

4. The semiconductor device according to claim 2, wherein said gate electrode comprises an N-type impurity at a relatively high concentration.