Method for fabricating a set of distributed feedback semiconductor lasers
First Claim
Patent Images
1. A method for fabricating a plurality of distributed feedback (DFB) semiconductor laser devices on a wafer surface, said DFB semiconductor laser devices including respective active layers having unique emission wavelengths different from one another, said method comprising the steps of:
- forming the active layers;
measuring peak gain wavelengths of said active layers formed on said wafer surface;
determining respective periods of diffraction gratings for different portions of said active layers so as to allow detuning amounts of said DFB laser devices to fall within a specified range, based on a distribution of said measured peak gain wavelengths within said wafer surface;
forming diffraction gratings having respective periods; and
forming an embedded layer, wherein said step of forming the respective diffraction gratings is preformed after said step of forming the active layers.
1 Assignment
0 Petitions
Accused Products
Abstract
A method for forming a set of DFB lasers includes the steps of forming active layers having different peak gain wavelengths, measuring the peak gain wavelengths of the active layers, and forming diffraction gratings having periods based on the measured peak gain wavelengths, the periods allowing the detuning amount of the DFB laser device to fall within a design value.
-
Citations
8 Claims
-
1. A method for fabricating a plurality of distributed feedback (DFB) semiconductor laser devices on a wafer surface, said DFB semiconductor laser devices including respective active layers having unique emission wavelengths different from one another, said method comprising the steps of:
-
forming the active layers;
measuring peak gain wavelengths of said active layers formed on said wafer surface;
determining respective periods of diffraction gratings for different portions of said active layers so as to allow detuning amounts of said DFB laser devices to fall within a specified range, based on a distribution of said measured peak gain wavelengths within said wafer surface;
forming diffraction gratings having respective periods; and
forming an embedded layer, wherein said step of forming the respective diffraction gratings is preformed after said step of forming the active layers. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
Specification