Transparent electroconductive film

• US 6,744,425 B2
• Filed: 11/21/2001
• Issued: 06/01/2004
• Est. Priority Date: 12/26/2000
• Status: Expired due to Fees

• Current Assignee: Bridgestone Corporation
• Original Assignee: Bridgestone Corporation
• Inventors: Kusano, Yukihiro, Yoshikawa, Masato, Nishida, Mitsuhiro, Iwabuchi, Yoshinori
• Primary Examiner(s): MCDONALD, RODNEY GLENN
• Application Number:
  US09/989,436
• Publication Number:
  US 20020127353A1
• Time in Patent Office: 923 Days
• Field of Search: 345/173, 178/18.01, 178/18.02, 178/18.03, 178/18.04, 178/18.05, 178/18.06, 178/18.07, 178/18.08, 178/18.09, 178/18.1, 178/18.11, 428/1.1, 428/1.3, 428/1.32, 428/1.33, 428/1.52, 428/447, 428/448, 428/450, 428/451, 428/345, 428/354
• US Class Current: 345/173
• CPC Class Codes: C09K 2323/00 Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
• CPC Class Codes: C09K 2323/03 Viewing layer characterised by chemical composition
• CPC Class Codes: C09K 2323/033 Silicon compound, e.g. glass or organosilicon
• CPC Class Codes: C09K 2323/053 Organic silicon compound, e.g. organosilicon
• CPC Class Codes: G06F 3/041 Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
• CPC Class Codes: G06F 3/045 using resistive elements, e.g. a single continuous surface or two parallel surfaces put in contact
• CPC Class Codes: H01B 1/08 oxides
• CPC Class Codes: H01B 1/22 the conductive material comprising metals or alloys
• CPC Class Codes: Y10T 428/25 Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
• CPC Class Codes: Y10T 428/31663 As siloxane, silicone or silane
• CPC Class Codes: Y10T 428/31667 Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product

Abstract

A transparent electroconductive film has a polymer film, a primary layer formed on the polymer film, and a transparent electroconductive thin film or a multi-lamination film composed of at least one metal-compound layer and at least one electroconductive-metal layer, formed on the primary layer. The primary layer is made of silicon compound. The primary layer is formed by sputtering, using a target having a density of 2.9 g/cm³ or more.

Claims

1. A transparent electroconductive film comprising:

a polymer film;

a primary layer coated on said polymer film and containing ultraviolet-curing resin and particles of at least one silicon compound having an average diameter of 1 nm to 5 μ

m and selected form the group consisting of SiC_x, SiN_x, SiC_xO_y, SiO_xN_y, and SiC_xO_yN_z, said particles of at least one silicon compound being included in 1-90 wt % to said ultraviolet-curing resin; and

a transparent electroconductive thin film formed on said primary layer.

2. A transparent electroconductive film as claimed in claim 1, wherein said primary layer has a thickness of 1 nm to 50 μ

m.

3. A transparent electroconductive film as claimed in claim 1, wherein said primary layer has a thickness of 1 run to 10 μ

m.

4. A transparent electroconductive film as claimed in claim 1, wherein said electroconductive thin film consists of metal oxide.

5. A transparent electroconductive film as claimed in claim 4, wherein said metal oxide is at least one selected from the group consisting of ITO, ATO, ZnO, ZnO doped with Al, and SnO₂.

6. A transparent electroconductive film as claimed in claim 4, wherein said electroconductive thin film has a thickness of 1 to 500 nm.

7. A transparent electroconductive film comprising:

a polymer film;

a primary layer coated on said polymer film and containing ultraviolet-curing resin and particles of at least one silicon compound having an average diameter of 1 nm to 5 μ

m and selected form the group consisting of SiC_x, SiN_x, SiC_xO_y, SiO_xN_y, and SiC_xO_yN_z, said particles of at least one silicon compound being included in 1-90 wt % to said ultraviolet-curing resin; and

a multi-lamination film comprising at least one metal-compound layer and at least one electroconductive-metal layer, formed on said primary layer.

8. A transparent electroconductive film as claimed in claim 7, wherein said primary layer has a thickness of 1 nm to 50 μ

m.

9. A transparent electroconductive film as claimed in claim 7, wherein each of said particles of silicon compound is provided with acryl groups, epoxy groups or carboxyl groups on its surface.

10. A transparent electroconductive film as claimed in claim 9, wherein said particles of silicon compound are particles of acryl-modified silica which are produced by condensing colloidal silica and acryl group-modified silane compound.

11. A transparent electroconductive film as claimed in claim 7, wherein said primary layer has a thickness of 1 nm to 10 μ

m.

12. A transparent electroconductive film as claimed in claim 7, wherein said metal-compound layer is made up of at least one selected from the group consisting of ITO, In₂O₃, SnO₂, ZnO, TiO₂, SiO₂ and SiN.

13. A transparent electroconductive film as claimed in claim 7, wherein said metal-compound layer is made up of composite metal composed of at least two selected from the group consisting of ITO, In₂O₃, SnO₂, ZnO, TiO₂, SiO₂ and SiN.

14. A transparent electroconductive film as claimed in claim 7, wherein said electroconductive-metal layer is made up of at least one selected from the group consisting of Ag, Au, Pt, Cu, Al, Cr, Ti, Zn, Sn, Ni, Co, Hf, Nb, Ta, W, Zr, Pb, Pd and In.

15. A transparent electroconductive film as claimed in claim 7, wherein said multi-lamination film is composed of metal-compound layers and electroconductive-metal layers which are laminated, alternately.