Application of wavefront sensor to lenses capable of post-fabrication power modification

• US 6,749,632 B2
• Filed: 03/20/2001
• Issued: 06/15/2004
• Est. Priority Date: 03/20/2000
• Status: Expired due to Term

• Current Assignee: California Institute of Technology, Regents of the University of California (University of California)
• Original Assignee: Calhoun Vision, Inc., California Institute of Technology, Regents of the University of California (University of California)
• Inventors: Maloney, Robert, Grubbs, Robert H., Kornfield, Julia A., Jethmalani, Jagdish M., Sandstedt, Christian A., Schwartz, Daniel M.
• Primary Examiner(s): Willse, David H.
• Assistant Examiner(s): Phan, Hieu
• Application Number:
  US09/813,598
• Publication Number:
  US 20020016629A1
• Time in Patent Office: 1,183 Days
• Field of Search: 623/4.1, 623/5.11, 623/5.14, 623/6-8-, 623/6-6-, 351/205, 351/206-216
• US Class Current: 623/6.22
• CPC Class Codes: A61B 3/1015 for wavefront analysis
• CPC Class Codes: A61F 2/1627 for changing index of refraction, e.g. by external means or by tilting
• CPC Class Codes: A61F 2/1635 for changing shape
• CPC Class Codes: B29D 11/00461 Adjusting the refractive index, e.g. after implanting
• CPC Class Codes: G02B 1/04 made of organic materials, e.g. plastics G02B1/08 takes precedence
• CPC Class Codes: G02B 1/043 Contact lenses
• CPC Class Codes: G02B 26/06 for controlling the phase of light G02B26/08 takes precedence , measuring optical phase difference G01J9/00
• CPC Class Codes: G02B 27/0025 for optical correction, e.g. distorsion, aberration
• CPC Class Codes: G02C 2202/14 Photorefractive lens material

Abstract

The present invention relates to methods of implementing an optical element having a refraction modulating composition. The methods include using a wavefront sensor to provide an optical measurement of the optical element. The present invention also relates to systems comprising an optical element having a refraction modulating composition and a wavefront sensor.

Claims

1. A system for correcting an aberration in an optical system comprising:

an optical element inserted within the optical system and, wherein the optical element comprises a first polymer matrix and a refraction modulating composition dispersed therein wherein the refraction modulating composition is capable of stimulus-induced polymerization; and

an optical measurement system for measuring the aberration in the inserted optical system and using a measurement of the aberration to determine the stimulus-induced polymerization.

2. The system of claim 1 wherein the optical measurement system comprises a wavefront sensor.

3. The system of claim 2 wherein the wave front sensor is a Shack-Hartmann wavefront sensor.

4. The system of claim 1 wherein the optical element is a lens.

5. The system of claim 4 wherein the optical element is an intraocular lens.

6. The system of claim 5 wherein the first polymer matrix is selected from the group consisting of polyacrylates, polymethacrylates, polyvinyls, and polysiloxanes.

7. The system of claim 5 wherein the refraction modulating composition includes a component selected from the group consisting of an acrylate, methacrylate, vinyl, siloxane, and phosphazine.

8. The system of claim 1 wherein the optical measurement system is an adaptive optics system, which comprises a wavefront sensor and a wavefront compensator.

9. The system of claim 8 wherein the wavefront compensator is selected from the group consisting of a deformable mirror, a micro-electromechanical membrane, and a segmented micromirror.

10. The system of claim 1 wherein the refraction modulation composition is capable of multiple stimulus-induced polymerizations.

11. A method comprising:

inserting an optical element into an optical system, wherein the optical element has a refraction modulating composition dispersed therein;

obtaining an optical measurement of the aberration of the optical system with the inserted optical element; and

inducing an amount of polymerization of the refraction modulating composition, wherein at least one of the amount and spatial distribution of polymerization is determined by the optical measurement.

12. The method of claim 11 wherein the aberration measurement is converted to a set of basis functions selected from the group consisting of Zernike polynomials and Seidel polynomials.

13. The method of claim 11 wherein the aberration measurement is a measurement of at least one of the group consisting of defocus, astigmatism, coma, spherical, and higher order aberrations.

14. The method of claim 11 wherein the optical measurement is a wavefront measurement of the optical system.

15. The system of claim 11 wherein the optical measurement system comprises a wavefront sensor.

16. The method of claim 11 wherein the optical measurement system is an adaptive optics system, which comprises a wavefront sensor and a wavefront compensator.

17. The method of claim 16 wherein the wavefront compensator is selected from the group consisting of a deformable mirror, a micro-electromechanical membrane, and a segmented micromirror.

18. The method of claim 11 wherein at least one of the amount and spatial distribution of polymerization is induced by a spatial light modulator or a digital micromirror device.

19. The method of claim 11 wherein the optical element is disposed within an eye.

20. The method of claim 19 wherein the aberration measurement is a set of basis function selected from the group consisting of Zernike polynomials and Seidel polynomials describing the measured aberrations.

21. The method of claim 19 wherein the aberration measurement is a measurement of at least one of the group consisting of defocus, astigmatism, coma, spherical, and higher order aberrations.

22. The method of claim 19 wherein the optical measurement is a wavefront measurement of the eye.

23. The method of claim 19 wherein the optical measurement is obtained after an interval of time when the intraocular lens is implanted.

24. The system of claim 19 wherein the optical measurement system comprises a wavefront sensor.

25. The method of any of claims 15 and 24, wherein the wave front sensor is a Shack-Hartmann wavefront sensor.

26. The method of claim 19 wherein the optical measurement system is an adaptive optics system, which comprises a wavefront sensor and a wavefront compensator.

27. The method of claim 26 wherein the wavefront compensator is selected from the group consisting of a deformable mirror, a micro-electromechanical membrane, and a segmented micromirror.

28. The method of claim 20 wherein at least one of the amount and spatial distribution of polymerization is induced by a spatial light modulator or a digital micromirror device.

29. The method of claim 11 wherein the refraction modulation composition is capable of multiple stimulus-induced polymerizations, the method further comprising:

repeating the obtaining and inducing steps until the aberration of the optical element is corrected.