Method and apparatus for scanning in scanning probe microscopy and presenting results

• US 6,752,008 B1
• Filed: 03/07/2002
• Issued: 06/22/2004
• Est. Priority Date: 03/08/2001
• Status: Active Grant

• Current Assignee: Terraspan LLC
• Original Assignee: General Nanotechnology LLC
• Inventors: Kley, Victor B.
• Primary Examiner(s): RAEVIS, ROBERT R
• Application Number:
  US10/094,148
• Time in Patent Office: 838 Days
• Field of Search: 731/05, 250/306, 250/307
• US Class Current: 73/105
• CPC Class Codes: G01Q 10/06 Circuits or algorithms therefor
• CPC Class Codes: Y10S 977/851 Particular movement or positioning of scanning tip
• CPC Class Codes: Y10S 977/852 for detection of specific nanostructure sample or nanostructure-related property

Abstract

Information is collected from a region of interest using a scanning probe microscope having a tip by moving the tip along at least one predefined path extending from a center location to a peripheral location in the region of interest and collecting information using the tip at a plurality of sample points along the at least one predefined path. The predefined path may be based on a radial line defined between the center location and the peripheral location, and may follow a zig-zag, sinusoidal, constant-curve, rectangular trajectory generally tracking the radial line.

Claims

1. A method for collecting information from a region of interest using a scanning probe microscope (SPM) having a tip, the method comprising:

moving said tip along at least one predefined path defined in said region of interest;

collecting information using said tip at a plurality of sample points along said predefined path;

detecting a predetermined pattern within said region of interest using said collected information; and

moving said tip to a desired location within said predetermined pattern.

2. The method of claim 1, wherein said predefined path is selected from the group consisting of

a path defined between a central location and a peripheral location in said region of interest,

a path that corresponds to a raster pattern in said region of interest, and

a path that corresponds to a random search pattern in said region of interest.

3. The method of claim 1, further comprising performing at least one measurement using said tip at said desired location.

4. The method of claim 3, wherein said at least one measurement relates to a characteristic selected from the group consisting of surface height, sidewall location, convex weighted limit, concave weighted limit, temperature, light intensity, tunnel current, electrical field strength, and magnetic field strength.

5. The method of claim 1, further comprising the step of:

performing at least one modification to a target structure using said tip at said desired location.

6. The method of claim 5, wherein said at least one modification relates to addition, removal, or movement of material on said target structure.

7. The method of claim 1, further comprising the step of:

moving said tip along an observation path defined with respect to said predetermined pattern; and

collecting information using said tip at a plurality of sample points along said observation path.

8. The method of claim 7, further comprising performing at least one measurement using said tip when said information collected along said observation path departs from said predetermined pattern.

9. The method of claim 8, wherein said at least one measurement relates to a characteristic selected from the group consisting of surface height, sidewall location, convex weighted limit, concave weighted limit, temperature, light intensity, tunnel current, electrical field strength, and magnetic field strength.

10. The method of claim 7, further comprising performing at least one modification to a target structure using said tip when said information collected along said observation path departs from said predetermined pattern.

11. The method of claim 7, wherein said observation path begins at a starting point and ends at a boundary point of said region of interest.

12. The method of claim 10, wherein said at least one modification relates to addition, removal, or movement of material on said target structure.

13. The method of claim 7, wherein said observation path is defined to track at least one parameter of said predetermined pattern at a target value or a target range of values.

14. The method of claim 13, wherein said at least one parameter relates to a characteristic selected from the group consisting of surface height, sidewall location, convex weighted limit, concave weighted limit, temperature, light intensity, tunnel current, electrical field strength, and magnetic field strength.

15. The method of claim 7, wherein said observation path begins at a starting point and returns to said starting point.

16. The method of claim 1, wherein said information includes at least one of surface height, sidewall location, convex weighted limit, concave weighted limit, temperature, light intensity, tunnel current, electrical field strength, and magnetic field strength in said region of interest.

17. A method for collecting information from a region of interest using a scanning probe microscope (SPM) having a tip, the method comprising:

moving said tip along at least one predefined path defined in said region of interest;

collecting information using said tip at a plurality of sample points along said predefined path;

detecting a predetermined pattern within said region of interest using said collected information; and

moving said tip to a desired location relative to said predetermined pattern, so detected.

18. The method of claim 17, wherein said predefined path is selected from the group consisting of

a path defined between a central location and a peripheral location in said region of interest,

a path that corresponds to a raster pattern in said region of interest, and

a path that corresponds to a random search pattern in said region of interest.

19. The method of claim 17, further comprising performing at least one measurement using said tip at said desired location.

20. The method of claim 19, wherein said at least one measurement relates to a characteristic selected from the group consisting of surface height, sidewall location, convex weighted limit, concave weighted limit, temperature, light intensity, tunnel current, electrical field strength, and magnetic field strength.

21. The method of claim 17, further comprising the step of:

performing at least one modification to a target structure using said tip at said desired location.

22. The method of claim 21, wherein said at least one modification relates to addition, removal, or movement of material on said target structure.

23. The method of claim 17, further comprising the step of:

moving said tip along an observation path defined with respect to said predetermined pattern; and

collecting information using said tip at a plurality of sample points along said observation path.

24. The method of claim 23, further comprising performing at least one measurement using said tip when said information collected along said observation path departs from said predetermined pattern.

25. The method of claim 24, wherein said at least one measurement relates to a characteristic selected from the group consisting of surface height, sidewall location, convex weighted limit, concave weighted limit, temperature, light intensity, tunnel current, electrical field strength, and magnetic field strength.

26. The method of claim 23, further comprising performing at least one modification to a target structure using said tip when said information collected along said observation path departs from said predetermined pattern.

27. The method of claim 26, wherein said at least one modification relates to addition, removal, or movement of material on said target structure.

28. The method of claim 23, wherein said observation path is defined to track at least one parameter of said predetermined pattern at a target value or a target range of values.

29. The method of claim 28, wherein said at least one parameter relates to a characteristic selected from the group consisting of surface height, sidewall location, convex weighted limit, concave weighted limit, temperature, light intensity, tunnel current, electrical field strength, and magnetic field strength.

30. The method of claim 23, wherein said observation path begins at a starting point and ends at a boundary point of said region of interest.

31. The method of claim 23, wherein said observation path begins at a starting point and returns to said starting point.

32. The method of claim 17, wherein said information includes at least one of surface height, sidewall location, convex weighted limit, concave weighted limit, temperature, light intensity, tunnel current, electrical field strength, and magnetic field strength in said region of interest.

33. A method for collecting information from a region of interest using a scanning probe microscope (SPM) having a tip, the method comprising:

moving said tip along at least one predefined path defined in said region of interest;

collecting information using said tip at a plurality of sample points along said predefined path;

detecting a predetermined pattern within said region of interest using said collected information;

moving said tip to a desired location relative to said predetermined pattern, so detected; and

performing at least one operation selected from the group consisting of

performing at least one measurement using said tip at said desired location,

performing at least one modification to a target structure using said tip at said desired location, and

collecting information using said tip at a plurality of sample points along an observation path defined with respect to said predetermined pattern.