Hybrid metallic-dielectric grating

• US 6,754,006 B2
• Filed: 09/19/2002
• Issued: 06/22/2004
• Est. Priority Date: 10/05/2001
• Status: Expired due to Fees

• Current Assignee: General Atomics, Inc.
• Original Assignee: General Atomics, Inc.
• Inventors: Barton, Ian Michael, Herman, Steve Mathew
• Primary Examiner(s): Dunn, Drew
• Assistant Examiner(s): ASSAF, FAYEZ G
• Application Number:
  US10/247,024
• Publication Number:
  US 20030067687A1
• Time in Patent Office: 642 Days
• Field of Search: 359/569, 359/572, 359/576, 359/580, 359/584, 359/585, 359/587, 359/589
• US Class Current: 359/569
• CPC Class Codes: G02B 5/1857 using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
• CPC Class Codes: G02B 5/1861 Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials G02B5/1809, G02B5/1828, G02B5/1833, G02B5/1838 and G02B5/1847 take precedence

Abstract

A diffraction grating includes a metallic base layer and layers of dielectric materials of varying refractive index, where a bottom interface of the layers is adherent to the metallic base layer. The dielectric layers are periodically spaced on top of the metallic base layer, leaving the metallic base layer exposed in regions. This grating allows for the polarization insensitive reflective properties of the base metallic layer to operate in conjunction with the polarization sensitive diffraction properties of the multilayer grating structure to provide near 100% diffraction efficiency over a reasonable wavelength bandwidth, independent of the polarization of the incident beam.

Claims

1. A grating, comprising:

a base layer comprising material that reflects electromagnetic radiation, wherein said base layer comprises metal; and

layers of dielectric material of varying refractive index, wherein a bottom interface of said layers is adherent to said base layer, wherein said layers are periodically spaced on top of said base layer, wherein said base layer is not covered by said layers in regions, wherein said grating comprises at least one Bragg plane.

2. The grating of claim 1, further comprising a polished substrate, wherein said base layer is a coating adherent to said polished substrate.

3. The grating of claim 1, wherein each layer of said layers comprises approximately a quarter-wave of optical thickness at a desired angle of incidence relative to said grating.

4. The grating of claim 1, wherein each layer of said layers comprises approximately a quarter-wave of optical thickness at one of the Bragg angles (grating orders) of said grating.

5. The grating of claim 1, wherein each layer of said layers comprises approximately a half-wave of optical thickness at a desired angle of incidence relative to said grating.

6. The grating of claim 1, wherein each layer of said layers comprises approximately a half-wave of optical thickness at one the Bragg angles (grating orders) of said grating.

7. The grating of claim 1, wherein each layer of said layers has an arbitrary thickness such that combined layers have an optical thickness that gives high reflected diffraction efficiency for the angle of incidence and wavelength used and acts as an angular filter to attenuate light in one of the unwanted diffraction orders.

8. The grating of claim 1, wherein said dielectric material is selected from the group consisting of Silica, Silicon Hafnia, Scandia and, Tantalum Pentoxide.

9. The grating of claim 1, wherein said layers are configured to act as an anti-reflection layer for one of the Bragg angles of said grating.

10. The grating of claim 1, wherein said layers are configured to act as a high reflector for one of the Bragg angles of the grating.

11. A grating, comprising:

a base layer comprising material that reflects electromagnetic radiation; and

layers of dielectric material of varying refractive index, wherein a bottom interface of said layers is adherent to said base layer, wherein said layers are periodically spaced on toy of said base layer, wherein said base layer is not covered by said layers in regions wherein said grating comprises at least one Bragg plane, wherein said base layer comprises a metal blank having a polished surface.

12. A grating, comprising:

a base layer comprising material that reflects electromagnetic radiation, and

layers of dielectric material of varying refractive index, wherein a bottom interface of said layers is adherent to said base layer, wherein said layers are periodically spaced on top of said base layer, wherein said base layer is not covered by said layers in regions, wherein said grating comprises at least one Bragg plane, wherein said layers have a protective layer of about a half-wave thickness for one of the Bragg planes of the grating.

13. A method for fabricating a grating, comprising:

providing a base layer comprising material that reflects electromagnetic radiation, wherein said base layer comprises metal; and

adhering layers of dielectric material of varying refractive index, wherein a bottom interface of said layers is adherent to said base layer, wherein said layers are periodically spaced on top of said base layer, wherein said base layer is not covered by said layers in regions, wherein said grating comprises at least one Bragg plane.

14. The method of claim 13, further comprising providing a polished substrate and adhering said base layer to said polished substrate.

15. The method of claim 13, wherein each layer of said layers comprises approximately a quarter-wave of optical thickness at a desired angle of incidence relative to said grating.

16. The method of claim 13, wherein each layer of said layers comprises approximately a quarter-wave of optical thickness at one of the Bragg angles (grating orders) of said grating.

17. The method of claim 13, wherein each layer of said layers comprises approximately a half-wave of optical thickness at a desired angle of incidence relative to said grating.

18. The method of claim 13, wherein each layer of said layers comprises approximately a half-wave of optical thickness at one the Bragg angles (grating orders) of said grating.

19. The method of claim 13, wherein each layer of said layers has an arbitrary thickness such that combined layers have an optical thickness that gives high reflected diffraction efficiency for the angle of incidence and wavelength used and acts as an angular filter to attenuate light in one of the unwanted diffraction orders.

20. The method of claim 13, wherein said dielectric material is selected from the group consisting of Silica, Silicon, Hafnia, Scandia and Tantalum Pentoxide.

21. The method of claim 13, wherein said layers are configured to act as an anti-reflection layer for one of the Bragg angles of said grating.

22. The method of claim 13, wherein said layers are configured to act as a high reflector for one of the Bragg angles of the grating.

23. A method for fabricating a grating, comprising:

providing a base layer comprising material that reflects electromagnetic radiation; and

adhering layers of dielectric material of varying refractive index, wherein a bottom interface of said layers is adherent to said base layer, wherein said layers are periodically spaced on top of said base layer, wherein said base layer is not covered by said layers in regions, wherein said grating comprises at least one Bragg plane, wherein said base layer comprises a metal blank having a polished surface.

24. A method for fabricating a grating, comprising:

providing a base layer comprising material that reflects electromagnetic radiation; and

adhering layers of dielectric material of varying refractive index, wherein a bottom interface of said layers is adherent to said base layer, wherein said layers are periodically spaced on toy of said base layer, wherein said base layer is not covered by said layers in regions, wherein said grating comprises at least one Brags plane, wherein said layers have a protective layer of about a half-wave thickness for one of the Bragg planes of the grating.