Polishing head assembly

• US 6,755,723 B1
• Filed: 09/29/2000
• Issued: 06/29/2004
• Est. Priority Date: 09/29/2000
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Lam Research Corporation
• Inventors: Pham, Xuyen N.
• Primary Examiner(s): Hail, III, Joseph J.
• Assistant Examiner(s): MCDONALD, SHANTESE L
• Application Number:
  US09/672,605
• Time in Patent Office: 1,369 Days
• Field of Search: 481/41, 481/287, 481/288, 481/296, 481/307
• US Class Current: 451/41
• CPC Class Codes: B24B 37/30 for single side lapping of plane surfaces

Abstract

A polishing head assembly for retaining an object that is subject to polishing with a polishing pad is disclosed. The polishing head assembly comprises a head retainer assembly movably coupled to a wafer carrier head. The head retainer assembly includes a gimbal post and a load suspension plate. The gimbal post and the load suspension plate are operable to transfer a loading force to the wafer carrier head during polishing. The gimbal post also provides gimballing to optimize the position of the object in parallel with the polishing pad. In addition, the load suspension plate provides distribution of the loading force to optimize the flatness of the object during polishing.

Claims

1. A polishing head assembly for retaining and manipulating an object having a surface that is subject to polishing, the polishing head assembly comprising:

a head retainer assembly;

a load suspension plate, the load suspension plate includes a gimbal area and a load control ring;

a gimbal post operably coupled to the head retainer assembly, the gimbal post operable to transfer a loading force to the gimbal area for distribution to the load control ring; and

a wafer carrier head movably coupled to the head retainer assembly, the wafer carrier head operably engaged with the load control ring and deformable with the loading force to optimize flatness of an object retained on the carrier head.

2. A polishing head assembly for retaining and manipulating an object having a surface that is subject to polishing, the polishing head assembly comprising:

a head retainer assembly, wherein the head retainer assembly is configured to rigidly engage a rotatable spindle;

a gimbal post coupled to the head retainer assembly;

a load suspension plate having a first surface and a second surface, wherein the gimbal post is operably engagable with the load suspension plate and the head retainer assembly is separated from the load suspension plate by die gimbal post; and

a wafer carrier head movably coupled to the head retainer assembly having a top surface and a bottom surface, wherein the top surface of the wafer carrier head is operably engaged with the second surface of the load suspension plate and the bottom surface of the wafer carrier head is operable to retain the object.

3. A polishing head assembly for retaining and manipulating an object, having a surface that is subject to polishing, the polishing head assembly comprising:

a head retainer assembly, wherein the head retainer assembly is configured to rigidly engage a rotatable spindle;

a gimbal post coupled to the head retainer assembly;

a load suspension plate having a first surface and a second surface, wherein the gimbal post is operably engagable with the load suspension plate; and

a wafer carrier head movably coupled to the head retainer assembly having a top surface and a bottom surface, wherein the top surface of the wafer carrier head is operably engaged with the second surface of the load suspension plate and the bottom surface of the wafer carrier head is operable to retain the object;

wherein the gimbal post comprises a first section positioned adjacent to a second section, wherein the first section operably cooperates with the second section to allow the second section, the load suspension plate and the wafer carrier head to gimbal with respect to the first section.

4. The polishing head assembly of claim 3 wherein the object is a semiconductor wafer.

5. The polishing head assembly of claim 3 wherein the gimbal post operably cooperates with the load suspension plate to allow the load suspension plate and the wafer carrier head to gimbal with respect to the head retainer assembly.

6. The polishing head assembly of claim 5 wherein a distal end of the gimbal post includes a convex area and the load suspension plate includes a concave area that operably cooperates with the convex area to allow the load suspension plate and the wafer carrier head to gimbal with respect to the head retainer assembly.

7. The polishing head assembly of claim 5 wherein a distal end of the gimbal post includes a concave area and the load suspension plate includes a convex area that operably cooperates with the concave area to allow the load suspension plate and the wafer carrier head to gimbal with respect to the head retainer assembly.

8. The polishing head assembly of claim 3 wherein a loading force applied to the head retainer assembly is transferable to the wafer carrier head by the gimbal post and the load suspension plate.

9. The polishing head assembly of claim 3 wherein the diameter of the suspension plate is selectable to control deformation of the wafer carrier head.

10. The polishing head assembly of claim 3 wherein loading applied to the gimbal post is transferable to the load suspension plate, the load suspension plate operable to uniformly apply loading to deform the wafer carrier head to optimize flatness of the object.

11. The polishing head assembly of claim 3, wherein the load suspension plate is operable to deform the wafer carrier head to optimize flatness of the object.

12. A polishing head assembly for retaining and manipulating an object having a surface that is subject to polishing, the polishing head assembly comprising:

a head retainer assembly, wherein the head retainer assembly is configured to rigidly engage a rotatable spindle;

a gimbal post coupled to the head retainer assembly;

a load suspension plate having a first surface and a second surface, wherein the gimbal post is operably engagable with the load suspension plate; and

a wafer carrier head movably coupled to the head retainer assembly having a top surface and a bottom surface, wherein the top surface of the wafer carrier head is operably engaged with the second surface of the load suspension plate and the bottom surface of the wafer carrier head is operable to retain the object;

wherein the load suspension plate operably engages the wafer carrier head with a load control ring.

13. The polishing head assembly of claim 12 wherein the diameter of the load control ring is between about 40% and 60% of the diameter of the bottom surface of the wafer carrier head.

14. The polishing head assembly of claim 12 wherein the diameter of the load control ring is between about 80% and 95% of the diameter of the bottom surface of the wafer carrier head.

15. The polishing head assembly of claim 12, wherein the load control ring is a flat plate.

16. A polishing head assembly for retaining and applying a loading force to an object having a surface that is subject to polishing by a polishing pad, the polishing head assembly comprising:

a wafer carrier bead detachably coupled to the object, wherein the wafer carrier head is operable to retain the object and maintain the object in contact with the polishing pad;

a head retainer assembly movably coupled to the wafer carrier head, wherein the head retainer assembly is configured to rigidly engage a rotatable spindle;

a load suspension plate operably engaged with the wafer carrier head wherein the load suspension plate is operable to control deformation of the wafer carrier head; and

a gimbal post operably coupled to the head retainer assembly and operably engagable with the load suspension plate, wherein lie loading force applied to the head retainer assembly is transferable to the wafer carrier head by the gimbal post and the load suspension plate;

wherein the load suspension plate comprises a gimbal area and a load control ring.

17. The polishing head assembly of claim 16 wherein the load control ring operably contacts a region of the wafer carrier head.

18. The polishing head assembly of claim 17 wherein the region is in a range between about 40% and 60% of the diameter of a surface of the wafer carrier head detachably coupled to the object.

19. The polishing head assembly of claim 17 wherein the region is in a range between about 80% and 95% of the diameter of a surface of the wafer carrier head detachably coupled to the object.

20. The polishing head assembly of claim 16 wherein the object is a semiconductor wafer.

21. A polishing head assembly for retaining and applying a loading force to an object having a surface that is subject to polishing by a polishing pad, the polishing head assembly comprising:

a wafer carrier head detachably coupled to the object, wherein the wafer carrier head is operable to retain the object and maintain the object in contact with the polishing pad;

a head retainer assembly movably coupled to the wafer carrier head, wherein the head retainer assembly is configured to rigidly engage a rotatable spindle;

a loud suspension plate operably engaged with the wafer carrier head, wherein the load suspension plate is operable to control deformation of the wafer carrier head; and

a gimbal post operably coupled to the head retainer assembly and operably engagable with the load suspension plate, wherein the loading force applied to the head retainer assembly is transferable to the wafer carrier head by the gimbal post and the load suspension plate;

wherein the gimbal post includes a convex area that forms a ball and the load suspension plate includes a concave area that forms a socket, wherein the ball and socket are operably engagable to allow the load suspension plate and the wafer carrier head to gimbal with respect to the head retainer assembly.

22. A polishing head assembly for retaining and applying a loading force to an object having a surface that is subject to polishing by a polishing pad, the polishing head assembly comprising:

a wafer carrier head detachably coupled to the object, wherein the wafer carrier head is operable to retain he object and maintain the object in contact. with the polishing pad;

a head retainer assembly movably coupled to the wafer carrier head, wherein the head retainer assembly is configured to rigidly engage a rotatable spindle;

a load suspension plate operably engaged with the wafer carrier head, wherein the load suspension plate is operable to control deformation of the wafer carrier head; and

a gimbal post operably coupled to the head retainer assembly and operably engagable with the toad suspension plate, wherein the loading force applied to the head retainer assembly is transferable to the wafer carrier head by the gimbal post and the load suspension plate;

wherein the gimbal post includes a concave area that forms a socket and the load suspension plate includes a convex area that forms a ball, wherein the ball and socket are operably engagable to allow the loud suspension plate and the wafer carrier head to gimbal with respect to the head retainer assembly.

23. A polishing head assembly for retaining and applying a loading force to an object having a surface that is subject, to polishing by a polishing pad, the polishing head assembly comprising:

a water carrier head detachably coupled to the object, wherein the wafer carrier head is operable to retain the object and maintain the object in contact with the polishing pad;

a head retainer assembly movably coupled to the wafer carrier head, wherein the head retainer assembly is configured to rigidly engage a rotatable spindle;

a load suspension plate operably engaged with the wafer carrier head, wherein the load suspension plate is operable to control deformation of the wafer carrier head; and

a gimbal post operably coupled to the bead retainer assembly and operably engagable with the load suspension plate, wherein the loading force applied to the head retainer assembly is transferable to the wafer carrier head by the gimbal post and the load suspension plate;

wherein the gimbal post comprises a first section and a second section, wherein the second section is operable engaged with the load suspension plate and the first section includes a convex area that is operably engagable with a concave area of the second section, wherein the first section operably cooperates with the second section to allow the second section, the load suspension plate and the wafer carrier head to gimbal with respect to the first section.