Plasma display panel suitable for high-quality display and production method

• US 6,761,608 B2
• Filed: 09/26/2001
• Issued: 07/13/2004
• Est. Priority Date: 11/27/1996
• Status: Expired due to Fees

• Current Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Original Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Inventors: Kudoh, Masatoshi, Shiokawa, Akira, Yasui, Hideaki, Suzuki, Shigeo, Kotera, Koichi, Aoki, Masaki, Murai, Ryuichi, Tanaka, Hiroyoshi, Ohtani, Mitsuhiro, Sasaki, Yoshiki, Nonomura, Kinzou
• Primary Examiner(s): Ramsey, Kenneth J.
• Application Number:
  US09/964,837
• Publication Number:
  US 20020036466A1
• Time in Patent Office: 1,021 Days
• Field of Search: 445/24, 445/25
• US Class Current: 445/25
• CPC Class Codes: H01J 11/12 with main electrodes provided on both sides of the discharge space
• CPC Class Codes: H01J 11/38 Dielectric or insulating layers
• CPC Class Codes: H01J 9/02 Manufacture of electrodes or electrode systems

Abstract

A PDP does not suffer from dielectric breakdown even though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 μm layer of a metallic oxide, on whose surface OH groups exist, such as ZnO, ZrO₂, MgO, TiO₂, Al₂O₃, and Cr₂O₃. The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is then coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.

Claims

1. A method for producing a PDP comprising:

a first step of attaching a first electrode onto a main surface of a first plate, and forming with a plasma spraying method a plurality of partition walls on the main surface of the first plate, wherein at least a part of the first electrode is exposed;

a second step of preparing a second plate; and

a third step of placing the first plate and the second plate in parallel to face each other, with the plurality of partition walls being placed between the first plate and the second plate so that a discharge space is formed between the first plate and the second plate.

2. The method for producing a PDP defined in claim 1, wherein

a source material for the plasma spraying method in the rust step is at least one of aluminium oxide (Al₂O₃) and mullite (3Al₂O₃.2SiO₂).

3. The method for producing a PDP defined in claim 1, wherein

between the first step and the second step, a dielectric layer is formed to coat the main surface of the first plate on which the first electrode and the plurality of partition walls exist.

4. The method for producing a PDP defined in claim 3 wherein the dielectric layer is one of a lead glass powder and a phosphoric acid glass powder deposited by a thermal spraying nozzle.

5. The method for producing a PDP defined in claim 1, wherein

the first plate used in the first step is made of borosilicate glass including 6.5% or less by weight of alkali.

6. The method for producing a PDP defined in claim 1 wherein a dielectric layer is formed to coat the surface of the partition walls.