Methods and systems for controlling the concentration of a component in a composition with absorption spectroscopy
First Claim
1. A semiconductor processing method, comprising:
- contacting a semiconductor wafer with a solution comprising a component to be monitored;
controlling the concentration of the component by a method comprising;
performing an absorption spectroscopy measurement on a sample of the solution; and
controlling the concentration of the component in the solution based on the absorption spectroscopy measurement using a feedback control loop.
1 Assignment
0 Petitions
Accused Products
Abstract
Provided are methods and systems for controlling the concentration of a component in a composition, and semiconductor processing methods and systems. One exemplary method of controlling the concentration of a component in a composition involves: providing a composition which has a liquid portion, wherein the liquid portion contains a component to be monitored; performing an absorption spectroscopy measurement on a sample of the composition; and controlling the concentration of the component in the composition based on the absorption spectroscopy measurement using a feedback control loop. The invention allows for controlling the concentration of a component in a composition, for example, a corrosion inhibitor in a chemical planarization (CMP) chemical, as well as in pre- and post-CMP storage/treatment chemicals, and can provide real time, accurate process control in a simple and robust manner.
-
Citations
14 Claims
-
1. A semiconductor processing method, comprising:
-
contacting a semiconductor wafer with a solution comprising a component to be monitored;
controlling the concentration of the component by a method comprising;
performing an absorption spectroscopy measurement on a sample of the solution; and
controlling the concentration of the component in the solution based on the absorption spectroscopy measurement using a feedback control loop. - View Dependent Claims (2, 3, 4, 5, 6, 7)
-
-
8. A semiconductor processing system, comprising:
-
a chemical bath tank containing a solution for treating a semiconductor substrate;
one or more conduits for introducing process materials into the chemical bath, the process materials comprising a component to be monitored;
an absorption spectroscopy measurement apparatus for measuring the concentration of the component in a sample of the solution; and
feedback control means for controlling the concentration of the component in the solution based on the absorption spectroscopy measurement. - View Dependent Claims (9, 10, 11, 12, 13, 14)
-
Specification