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Maskless photolithography using plasma displays

  • US 6,764,796 B2
  • Filed: 06/25/2002
  • Issued: 07/20/2004
  • Est. Priority Date: 06/27/2001
  • Status: Expired due to Fees
First Claim
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1. A system for maskless photolithography comprising:

  • a. a computer system for generating mask patterns; and

    b. a plasma display, having individually addressable pixels, operably connected to and controllable by said computer system, wherein said display generates a patterned light beam corresponding to said mask patterns provided by said computer system to expose an object to said patterned light beam and to create patterns on the object corresponding to said mask patterns.

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