Method for making trench mosfet having implanted drain-drift region

• US 6,764,906 B2
• Filed: 12/12/2002
• Issued: 07/20/2004
• Est. Priority Date: 07/03/2001
• Status: Expired due to Term

• Current Assignee: Siliconix Incorporated (Vishay Intertechnology Incorporated)
• Original Assignee: Siliconix Incorporated (Vishay Intertechnology Incorporated)
• Inventors: Darwish, Mohamed N.
• Primary Examiner(s): Pham, Long
• Application Number:
  US10/317,568
• Publication Number:
  US 20030102564A1
• Time in Patent Office: 586 Days
• Field of Search: 438/270, 438/268, 438/558, 438/271, 438/272
• US Class Current: 438/270
• CPC Class Codes: H01L 21/2253 by ion implantation
• CPC Class Codes: H01L 29/0634 Multiple reduced surface field (multi-RESURF) structures, e.g. double RESURF, charge compensation, cool, superjunction (SJ), 3D-RESURF, composite buffer (CB) structures
• CPC Class Codes: H01L 29/0847 of field-effect transistors with insulated gate H01L29/0653 takes precedence; with a passive supplementary region between source or drain and substrate related to punch-through, capacity or isolation phenomena H01L29/1079; with LDD or DDD structure H01L29/7833; for thin film transistors H01L29/78618
• CPC Class Codes: H01L 29/0878 Impurity concentration or distribution
• CPC Class Codes: H01L 29/1095 Body region, i.e. base region, of DMOS transistors or IGBTs cell layout H01L29/0696
• CPC Class Codes: H01L 29/7811 with an edge termination structure guard regions per se H01L29/0619; field plates per se H01L29/402
• CPC Class Codes: H01L 29/7813 with trench gate electrode, e.g. UMOS transistors trench gate electrodes per se H01L29/4236
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

A trench MOSFET is formed in a structure which includes a P-type epitaxial layer overlying an N+ substrate. A trench is formed in the epitaxial layer. A deep implanted N layer is formed below the trench at the interface between the substrate and the epitaxial layer, and N-type dopant is implant through the bottom of the trench to form an N region in the epitaxial layer below the trench but above and separated from the deep N layer. The structure is heated to cause the N layer to diffuse upward and the N region to diffuse downward. The diffusions merge to form a continuous N-type drain-drift region extending from the bottom of the trench to the substrate. Alternatively, the drain-drift region may be formed by implanting N-type dopant through the bottom of the trench at different energies, creating a stack of N-type regions that extend from the bottom of the trench to the substrate.

Claims

1. A process of fabricating a power MOSFET comprising:

providing a substrate of a first conductivity type;

providing an epitaxial layer of a second conductivity type opposite to said first conductivity type on the substrate;

forming a trench in the epitaxial layer;

implanting dopant of said first conductivity type through a bottom of the trench to form a drain-drift region beneath said trench and within said epitaxial layer, immediately following said implanting said drain-drift region extending from said trench to said substrate;

forming an insulating layer along the bottom and a sidewall of the trench;

introducing a conductive gate material into the trench; and

introducing dopant of the first conductivity type into the epitaxial layer to form a source region, the drain-drift region and the source region being formed under conditions such that the source region and drain-drift region are separated by a channel region of the epitaxial layer adjacent the sidewall of the trench.

2. The process of claim 1 wherein providing an epitaxial layer comprises growing an epitaxial layer of the second conductivity type on the substrate.

3. The process of claim 1 wherein providing an epitaxial layer comprises growing an epitaxial layer of said first conductivity type and implanting dopant of a second conductivity type opposite to said first conductivity type into said epitaxial layer.

4. The process of claim 3 comprising heating said epitaxial layer so as to diffuse said dopant of said second conductivity type to an interface between said epitaxial layer and said substrate.

5. The process of claim 1 comprising implanting dopant of said second conductivity type into said epitaxial layer to form a body region.

7. A process of fabricating a power MOSFET comprising:

providing a substrate of a first conductivity type;

providing an epitaxial layer of a second conductivity type opposite to said first conductivity type on the substrate;

forming a trench in the epitaxial layer;

implanting dopant of said first conductivity type through a bottom of the trench to form a region of dopant beneath said trench and within said epitaxial layer, said region of dopant being located above and separated from said substrate;

heating said substrate so as to cause said region of dopant to diffuse downward so as to form a drift-drain region extending from said bottom of said trench to said substrate;

forming an insulating layer along the bottom and a sidewall of the trench;

introducing a conductive gate material into the trench; and

introducing dopant of the first conductivity type into the epitaxial layer to form a source region, the drain-drift region and the source region being formed under conditions such that the source region and drain-drift region are separated by a channel region of the epitaxial layer adjacent the sidewall of the trench.

6. The process of claim 7 wherein implanting dopant of said first conductivity type through a bottom of the trench to form a drain-drift region comprises implanting dopant at an energy of from 100 keV to 2.0 MeV.

8. The process of claim 7 wherein providing an epitaxial layer comprises growing an epitaxial layer of the second conductivity type on the substrate.

9. The process of claim 7 wherein providing an epitaxial layer comprises growing an epitaxial layer of said first conductivity type and implanting dopant of a second conductivity type opposite to said first conductivity type into said epitaxial layer.

10. The process of claim 9 comprising heating said epitaxial layer so as to diffuse said dopant of said second conductivity type to an interface between said epitaxial layer and said substrate.

11. The process of claim 7 comprising implanting dopant of said second conductivity type into said epitaxial layer to form a body region.

12. The process of claim 7 wherein implanting dopant of said first conductivity type through a bottom of the trench to form a region of dopant comprises implanting dopant at an energy of from 30 keV to 300 keV.

13. A process of fabricating a power MOSFET comprising:

providing a substrate of a first conductivity type;

providing an epitaxial layer of a second conductivity type opposite to said first conductivity type on the substrate;

forming a trench in the epitaxial layer;

implanting dopant of said first conductivity type through a bottom of the trench to form a deep layer of dopant beneath said trench and approximately at an interface between said substrate and said epitaxial layer, said deep layer of dopant being located below and separated from said trench;

heating said substrate so as to cause said deep layer of dopant to diffuse upward so as to form a drift-drain region extending from said bottom of said trench to said substrate;

forming an insulating layer along the bottom and a sidewall of the trench;

introducing a conductive gate material into the trench; and

introducing dopant of the first conductivity type into the epitaxial layer to form a source region, the drain-drift region and the source region being formed under conditions such that the source region and drain-drift region are separated by a channel region of the epitaxial layer adjacent the sidewall of the trench.

14. The process of claim 13 wherein providing an epitaxial layer comprises growing an epitaxial layer of the second conductivity type on the substrate.

15. The process of claim 13 wherein providing an epitaxial layer comprises growing an epitaxial layer of said first conductivity type and implanting dopant of a second conductivity type opposite to said first conductivity type into said epitaxial layer.

16. The process of claim 15 comprising heating said epitaxial layer so as to diffuse said dopant of said second conductivity type to an interface between said epitaxial layer and said substrate.

17. The process of claim 13 comprising implanting dopant of said second conductivity type into said epitaxial layer to form a body region.

18. The process of claim 13 wherein implanting dopant of said first conductivity type through a bottom of the trench to form a deep layer of dopant comprises implanting dopant at an energy of from 300 keV to 3.0 MeV.

19. A process of fabricating a power MOSFET comprising:

providing a substrate of a first conductivity type;

providing an epitaxial layer of a second conductivity type opposite to said first conductivity type on the substrate;

forming a trench in the epitaxial layer;

implanting dopant of said first conductivity type through a bottom of the trench to form a deep layer of dopant beneath said trench and approximately at an interface between said substrate and said epitaxial layer;

implanting dopant of said first conductivity type through a bottom of the trench to form a region of dopant beneath said trench and within said epitaxial layer, said region of dopant being located above and separated from said deep layer of dopant;

heating said substrate so as to cause said deep layer of dopant to diffuse upward and said region of dopant to diffuse downward, said deep layer and said region merging to form a drift-drain region extending from said bottom of said trench to said substrate;

forming an insulating layer along the bottom and a sidewall of the trench;

introducing a conductive gate material into the trench; and

introducing dopant of the first conductivity type into the epitaxial layer to form a source region, the drain-drift region and the source region being formed under conditions such that the source region and drain-drift region are separated by a channel region of the epitaxial layer adjacent the sidewall of the trench.

20. The process of claim 19 wherein providing an epitaxial layer comprises growing an epitaxial layer of the second conductivity type on the substrate.

21. The process of claim 19 wherein providing an epitaxial layer comprises growing an epitaxial layer of said first conductivity type and implanting dopant of a second conductivity type opposite to said first conductivity type into said epitaxial layer.

22. The process of claim 21 comprising heating said epitaxial layer so as to diffuse said dopant of said second conductivity type to an interface between said epitaxial layer and said substrate.

23. The process of claim 19 comprising implanting dopant of said second conductivity type into said epitaxial layer to form a body region.

24. The process of claim 19 wherein implanting dopant of said first conductivity type through a bottom of the trench to form a region of dopant comprises implanting dopant at an energy of from 30 keV to 300 keV.

25. The process of claim 19 wherein implanting dopant of said first conductivity type through a bottom of the trench to form a deep layer of dopant comprises implanting dopant at an energy of from 300 keV to 3.0 MeV.

26. A process of fabricating a power MOSFET comprising:

providing a substrate of a first conductivity type;

growing an epitaxial layer on the substrate;

forming a trench in the epitaxial layer;

implanting dopant of said first conductivity type through a bottom of the trench to form a first region of dopant beneath said trench;

implanting dopant of said first conductivity type through a bottom of the trench to form a second region of dopant beneath said trench, said first and second regions overlapping each other immediately after said implanting, said first and second regions being arranged in a stack extending between said trench and said substrate;

forming an insulating layer along the bottom and a sidewall of the trench;

introducing a conductive gate material into the trench; and

introducing dopant of the first conductivity type into the epitaxial layer to form a source region, the drain-drift region and the source region being formed under conditions such that the source region and drain-drift region are separated by a channel region of the epitaxial layer adjacent the sidewall of the trench.

27. The process of claim 26 where said substrate is not subjected to any substantial thermal processing after said implanting of dopant to form said first and second regions.

28. A process of fabricating a power MOSFET comprising:

providing a substrate of a first conductivity type;

growing an epitaxial layer on the substrate;

forming a trench in the epitaxial layer;

implanting dopant of said first conductivity type through a bottom of the trench at a plurality of predetermined energies to form a plurality of dopant regions of dopant beneath said trench, immediately after said implanting adjacent ones of said dopant regions overlapping so as to form a stack extending between said trench and said substrate;

forming an insulating layer along the bottom and a sidewall of the trench;

introducing a conductive gate material into the trench; and

introducing dopant of the first conductivity type into the epitaxial layer to form a source region, the drain-drift region and the source region being formed under conditions such that the source region and drain-drift region are separated by a channel region of the epitaxial layer adjacent the sidewall of the trench.