Monolithic millimeter wave reflect array system
First Claim
1. A monolithic millimeter wave reflector array system comprising:
- a monolithic semiconductor substrate and means disposed on said substrate for coherently reflecting electromagnetic energy, said means including an array of cells, each of said cells including an antenna for receiving said electromagnetic energy, an amplifier connected to said receive antenna, and an output antenna.
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Accused Products
Abstract
A monolithic semiconductor power device. The device is designed to produce high energy density and high power level RF/Millimeter wave radiation using the quasi-optical spatial power of an array (100) of small amplifiers (200) on a solid state wafer (300). Each cell (200) of the array (100) contains a reflection amplifier (206) that receives radiation and retransmits the signal back into the approximate same direction from which it was received. The radiation exiting from the array (100) is physically like a reflection that has been modified by the individual amplifier'"'"'s characteristics. The exiting amplified radiation leaves the array (100) as a coherent wave front (110). The individual amplifier elements are fabricated on a monolithic solid state wafer (300). Rather than being diced into individual amplifiers, the elements are electrically connected together with proper biases and ground levels on the actual solid state wafer.
40 Citations
5 Claims
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1. A monolithic millimeter wave reflector array system comprising:
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a monolithic semiconductor substrate and means disposed on said substrate for coherently reflecting electromagnetic energy, said means including an array of cells, each of said cells including an antenna for receiving said electromagnetic energy, an amplifier connected to said receive antenna, and an output antenna. - View Dependent Claims (2, 3, 4, 5)
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Specification
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- Resources
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Current AssigneeRaytheon Company (Rtx Corporation)
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Original AssigneeRaytheon Company (Rtx Corporation)
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InventorsBrown, Kenneth W., Gallivan, James R.
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Primary Examiner(s)Nguyen, Hoang V.
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Application NumberUS10/153,140Time in Patent Office792 DaysField of Search343/700.MS, 343/795, 343/754, 343/909, 343/912, 343/850, 343/853US Class Current343/700.0MSCPC Class CodesH01Q 21/061 Two dimensional planar arraysH01Q 3/46 Active lenses or reflecting...
