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High throughput thin film deposition and substrate handling method and apparatus for optical disk processing

  • US 6,767,439 B2
  • Filed: 11/07/2001
  • Issued: 07/27/2004
  • Est. Priority Date: 07/19/1999
  • Status: Expired due to Fees
First Claim
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1. An apparatus for depositing at least one thin film on a substrate useful in electronic applications, the apparatus comprising:

  • (a) an in-line continuously moving web for simultaneously transporting a number of substrates to which a thin film of material is to be applied, wherein said moving web is a roll-to-roll moving disposable web consisting essentially of a polymeric material and wherein said substrates are held to said web by friction against or electrostatic attraction to a web surface;

    (b) a central processing chamber which is maintained under vacuum and through which at least a portion of said continuously moving web travels;

    (c) at least one deposition device which is located within said central processing chamber, where at least a portion of said continuously moving web is exposed to material deposited from said deposition device;

    (d) a first moving platform which moves in an x direction and a y direction, which transfers a substrate onto said continuously moving web; and

    (e) a second moving platform which moves in an x direction and a y direction, which transfers a substrate from said continuously moving web.

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