High throughput thin film deposition and substrate handling method and apparatus for optical disk processing

• US 6,767,439 B2
• Filed: 11/07/2001
• Issued: 07/27/2004
• Est. Priority Date: 07/19/1999
• Status: Expired due to Fees

• Current Assignee: Young Park
• Original Assignee: Young Park
• Inventors: Park, Young
• Primary Examiner(s): MCDONALD, RODNEY GLENN
• Application Number:
  US10/045,849
• Publication Number:
  US 20030106791A1
• Time in Patent Office: 993 Days
• Field of Search: 204/192.12, 204/298.23, 204/298.24, 204/298.25, 204/298.15, 204/298.35, 118/718, 118/719, 118/729, 427/255.5, 156/345.31, 156/345.54
• US Class Current: 204/298.25
• CPC Class Codes: C23C 14/568 Transferring the substrates through a series of coating stations C23C14/562 takes precedence

Abstract

The disclosure herein relates to a high throughput system for thin film deposition on substrates which can be used in applications such as optical disks, and in particular DVD disks, chip-scale packaging, and plastic based display, for example. An apparatus useful in the production of products of the kind described above includes: (a) a continuously moving web for simultaneously transporting a number of substrates to which a thin film of material is to be applied, wherein the moving web is a roll-to-roll moving web; (b) a central processing chamber which is maintained under vacuum and through which at least a portion of said continuously moving web travels; and, (c) at least one deposition device which is located within said central processing chamber, where at least a portion of said continuously moving web is exposed to material deposited from said deposition device. Typically the deposition device is a magnetron sputtering device. In addition, the apparatus typically also includes (d) a first moving platform which transfers a substrate onto said continuously moving web, and (e) a second moving platform which receives processed substrates from said continuously moving web.

Claims

1. An apparatus for depositing at least one thin film on a substrate useful in electronic applications, the apparatus comprising:

(a) an in-line continuously moving web for simultaneously transporting a number of substrates to which a thin film of material is to be applied, wherein said moving web is a roll-to-roll moving disposable web consisting essentially of a polymeric material and wherein said substrates are held to said web by friction against or electrostatic attraction to a web surface;

(b) a central processing chamber which is maintained under vacuum and through which at least a portion of said continuously moving web travels;

(c) at least one deposition device which is located within said central processing chamber, where at least a portion of said continuously moving web is exposed to material deposited from said deposition device;

(d) a first moving platform which moves in an x direction and a y direction, which transfers a substrate onto said continuously moving web; and

(e) a second moving platform which moves in an x direction and a y direction, which transfers a substrate from said continuously moving web.

2. The apparatus of claim 1, wherein at least one deposition device is a sputtering device.

3. The apparatus of claim 1, wherein a device is present which permits web splicing during continuous operation of said apparatus.

4. The apparatus of claim 1, wherein said polymeric material is PET.

5. The apparatus of claim 2, wherein a power applied to a cathode in said sputtering device is RF power.

6. The apparatus of claim 5, wherein said cathode is a sputtering target.

7. The apparatus of claim 6, wherein a sputtering target used in said sputtering device is rectangular in shape.

8. The apparatus of claim 6, wherein said sputtering target is comprised of a ceramic or metal.

9. The apparatus of claim 8, wherein said sputtering target is comprised of a material having optical transmission properties useful in optical applications.

10. The apparatus of claim 2, wherein said sputtering device includes a planar magnetron.

11. The apparatus of claim 1, wherein at least one isolating shield is used to separate one thin film deposition area from another thin film deposition area.

12. The apparatus of claim 1, wherein at least said first or said second moving platform is located within a plenum chamber which is at a pressure which is different from the pressure in said central processing chamber.

13. The apparatus of claim 1, wherein said central processing chamber is maintained at a base vacuum of at least 10⁻

5 Torr (1.3×

10<sup>−

3</sup> Pa).

14. The apparatus of claim 1, wherein said apparatus also includes a cooling surface which permits the cooling of said continuously moving disposable web within said central processing chamber.

15. The apparatus of claim 1, wherein said disposable web material is polyvinylidine chloride.