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Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor

  • US 6,770,166 B1
  • Filed: 06/29/2001
  • Issued: 08/03/2004
  • Est. Priority Date: 06/29/2001
  • Status: Active Grant
First Claim
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1. A plasma processing chamber, comprising:

  • a bottom electrode configured to hold a substrate;

    a first and a second radio frequency (RF) power supply being connected to the bottom electrode;

    a passive top electrode being electrically isolated from a top ground extension;

    a filter array defining a set of filtering settings; and

    a switch being coupled to the top electrode and the filter array, the switch being configured to interconnect the top electrode to a selected one of the set of filtering settings, the selection of one of the filtering settings being configured to substantially enable or disable RF current generated from one or both of the first RF power supply and the second RF power supply from passing through the top electrode.

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