Integrated circuit inductors
First Claim
1. A method comprising:
- boring a plurality of holes in a substrate; and
fabricating a conductive path linking the plurality of holes, wherein boring includes irradiating the substrate.
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Accused Products
Abstract
The invention relates to an inductor comprising a plurality of interconnected conductive segments interwoven with a substrate. The inductance of the inductor is increased through the use of coatings and films of ferromagnetic materials such as magnetic metals, alloys, and oxides. The inductor is compatible with integrated circuit manufacturing techniques and eliminates the need in many systems and circuits for large off chip inductors. A sense and measurement coil, which is fabricated on the same substrate as the inductor, provides the capability to measure the magnetic field or flux produced by the inductor. This on chip measurement capability supplies information that permits circuit engineers to design and fabricate on chip inductors to very tight tolerances.
35 Citations
36 Claims
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1. A method comprising:
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boring a plurality of holes in a substrate; and
fabricating a conductive path linking the plurality of holes, wherein boring includes irradiating the substrate. - View Dependent Claims (7, 8, 9)
forming a magnetic film atop the substrate; and
traversing the magnetic film with a portion of the conductive path.
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2. A method comprising:
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boring a plurality of holes in a substrate; and
fabricating a conductive path linking the plurality of holes wherein boring a plurality of holes in the substrate comprises;
positioning a drill on the substrate; and
drilling a hole in the substrate.
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3. A method comprising:
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boring a plurality of holes in a substrate; and
fabricating a conductive path linking the plurality of holes wherein boring a plurality of holes in the substrate comprises;
aiming a laser at the substrate; and
burning a hole in the substrate.
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4. A method comprising;
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boring a number of substantially parallel holes in a substrate having a coating;
depositing a conductive path linking the number of holes and operable for inducing a magnetic flux in the coating, wherein boring includes irradiating the substrate. - View Dependent Claims (5, 10, 11, 12, 13, 14)
filling the holes with a conductive material; and
connecting the holes with a conductive material.
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10. The method of claim 4, including:
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filling the holes with a first conductive material; and
connecting the first conductive material with segments of a second conductive material.
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11. The method of claim 4, wherein the first conductive material is aluminum or copper.
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12. The method of claim 4, including forming the segments of the second conductive material so that a number of the segments of the second conductive material traverse the coating.
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13. The method of claim 4, including forming the coating from a magnetic film.
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14. The method of claim 13, including forming an insulating layer over the magnetic film.
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6. A method comprising:
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drilling a plurality of holes in a substrate;
filling the plurality of holes with a conductive material to form a plurality of conductive segments; and
interconnecting the plurality of conductive segments to form a coil. - View Dependent Claims (15, 16, 17)
coating a portion of the substrate; and
traversing the coating with a number of the plurality of conductive segments.
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16. The method of claim 15, including forming the coating as a magnetic film.
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17. The method of claim 16, including forming an insulating layer over the magnetic film and over the number of conductive segments.
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18. A method of forming an inductor, comprising:
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coating a portion of a surface of a substrate with a magnetic film;
boring a plurality of through holes adjacent the magnetic film that pass through the substrate; and
forming a conductive path integral with the substrate by forming first conductive segments in the through holes and forming second conductive segments that connect to the first conductive segments to form a coil. - View Dependent Claims (19, 20, 21, 22)
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23. A method of forming an inductor integral with a semiconductor substrate, comprising:
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forming a plurality of holes in the semiconductor substrate that connect opposing surfaces of the substrate; and
interweaving a conductor through the plurality of holes to form a coil surrounding a portion of the substrate, wherein forming the plurality of holes includes irradiating the semiconductor substrate.
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24. A method of forming an inductor integral with a semiconductor substrate, comprising:
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forming a plurality of holes in the semiconductor substrate that connect opposing surfaces of the substrate; and
interweaving a conductor through the plurality of holes to form a coil surrounding a portion of the substrate, wherein the coil has an inductance, and further comprising;
forming a magnetic film on one of the surfaces of the substrate; and
traversing the magnetic film with a portion of the coil so as to increase the inductance of the coil.- View Dependent Claims (25, 28)
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26. A method of forming an inductor integral with a semiconductor substrate, comprising:
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forming a plurality of holes in the semiconductor substrate that connect opposing surfaces of the substrate; and
interweaving a conductor through the plurality of holes to form a coil surrounding a portion of the substrate, wherein forming the plurality of holes includes drilling the holes with a laser.
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27. A method of forming an inductor integral with a semiconductor substrate, comprising:
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forming a plurality of holes in the semiconductor substrate that connect opposing surfaces of the substrate; and
interweaving a conductor through the plurality of holes to form a coil surrounding a portion of the substrate, wherein forming the plurality of holes includes drilling the holes with a drill bit.
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29. A method of forming an inductor comprising;
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forming a coating on a portion of a surface of a substrate;
forming a plurality of holes through the substrate adjacent opposing edges of the coating; and
forming a conductive coil that passes through the plurality of holes and is operable to induce a magnetic flux in the coating, wherein forming the plurality of holes includes irradiating the substrate.
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30. A method of forming an inductor comprising:
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forming a coating on a portion of a surface of a substrate;
forming a plurality of holes through the substrate adjacent opposing edges of the coating; and
forming a conductive coil that passes through the plurality of holes and is operable to induce a magnetic flux in the coating, wherein forming the coating includes depositing a magnetic film.
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31. A method of forming an inductor, comprising;
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boring a plurality of holes in a semiconductor substrate; and
forming a conductive coil integral with the substrate, the conductive coil having segments passing through the plurality of holes, wherein boring includes irradiating the substrate. - View Dependent Claims (33)
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32. A method of forming an inductor, comprising;
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boring a plurality of holes in a semiconductor substrate; and
forming a conductive coil integral with the substrate, the conductive coil having segments passing through the plurality of holes, including boring the plurality of holes so as to form a conductive coil having a triangular cross-section. - View Dependent Claims (36)
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34. A method of forming an inductor, comprising;
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boring a plurality of holes in a semiconductor substrate; and
forming a conductive coil integral with the substrate, the conductive coil having segments passing through the plurality of holes, wherein boring the plurality of holes includes irradiating the substrate with a laser.
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35. A method of forming an inductor, comprising;
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boring a plurality of holes in a semiconductor substrate; and
forming a conductive coil integral with the substrate, the conductive coil having segments passing through the plurality of holes, wherein boring the plurality of holes includes drilling the substrate with a drill bit.
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Specification