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Ejection head for aggressive liquids manufactured by anodic bonding

  • US 6,780,340 B2
  • Filed: 11/26/2002
  • Issued: 08/24/2004
  • Est. Priority Date: 05/29/2000
  • Status: Expired due to Term
First Claim
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1. Method for manufacturing an ejection head (10;

  • 110), or ejector, suitable for ejecting a liquid (14;

    140) in the form of droplets (16), and possessing internally a hydraulic circuit (21;

    121) for containing and conveying said liquid (14;

    140), comprising the following phases;

    producing a nozzle plate (12;

    112) having at least one ejection nozzle (13;

    113a, 113b, 113c);

    producing a substrate (11;

    111) or actuation support having at least one actuator (15;

    115a, 115b, 115c) for activating the ejection of said droplets (16) of liquid through said at least one nozzle (13;

    113a, 113b, 113c); and

    integrally joining said nozzle plate (12;

    112) and said substrate (11;

    111) together to form said ejection head (10;

    110) and the relative hydraulic circuit (21;

    121), this joining phase comprising the production by means of the so-called “

    anodic bonding”

    technology of a junction (25;

    125), between said nozzle plate (12;

    112) and said substrate (11;

    111), arranged for being wetted by said liquid (14;

    140) contained in the hydraulic circuit (25;

    125), wherein the phase of producing said nozzle plate (12;

    112) includes the following steps;

    providing a plate or wafer (51) made of silicon, selectively removing the silicon of said plate (51) down a given depth, so as to form, along a face (51a) of said plate, a recess (54) defining a chamber (20) of said hydraulic circuit (21), and forming, by means of an etching process and along a bottom (61) of said recess (54), said at least one ejection nozzle (13), wherein the phase of producing said substrate (11;

    111) includes the following steps;

    providing a plate of wafer (70, 71) made of silicon, forming, on an outer surface of said plate (11), said at least one actuator (15) and the tracks (72) for the electrical connection of it, depositing a first protective layer (76) on said at least one actuator (15), depositing a second protective and conductive layer (77) over said first protective layer (76), said second conductive layer (77) being arranged in the area of said at least one actuator (15) and in the junction zone where said substrate (11) will be joined together with said nozzle plate (12), and moreover forming a portion (77a) which extends, along said substrate (11), outside said junction zone, depositing a preliminary layer of glass (78) on said conductive protection layer (77), said preliminary layer having the purpose of preparing said substrate (11) for being joined with said nozzle plate (12) by means of said anodic banding technology, and subsequently etching said layer of glass (78) to uncover the zone of said actuator (15) and to define the junction areas (78a) between said substrate (11) and said nozzle plate (12), and wherein the joining phase includes the following steps;

    positioning into reciprocal contact said nozzle plate (12;

    112) of silicon and said substrate (11;

    111), in correspondence of said layer of glass (78), in such a way to arrange exactly said at least one nozzle (13;

    113a, 113b, 113c) in front of said at least one actuator (15;

    115a, 115b, 115c), and affecting said junction (25) between said nozzle plate (12) and said substrate (11) by connecting said nozzle plate (12) and said portion (77a) of said conductive layer (77) respectively to a first (81) and a second counter-electrode (82) of an appropriate anodic bonding machine (85), and then applying by means of said machine (85) a determined voltage between said counter-electrodes (81, 82), said first counter-electrode (81) being formed of a plate which rests on said nozzle plate (12) along the side bearing said ejection nozzle (13) and acts as the anode during the production of said junction (25), whereas said second counter-electrode (82) acts as the cathode, whereby a structural cohesion is obtained between the two surfaces of silicon and of glass (78), in reciprocal contact, respectively of said nozzle plate (12) and of said substrate (11).

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