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Temperature measuring method and apparatus, measuring method for the thickness of the formed film, measuring apparatus for the thickness of the formed film thermometer for wafers

  • US 6,780,657 B2
  • Filed: 07/29/2002
  • Issued: 08/24/2004
  • Est. Priority Date: 03/19/1998
  • Status: Expired due to Fees
First Claim
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1. A temperature measuring method, comprising the steps of:

  • detecting an intensity of light radiated from an object and an intensity of light reflected from said object when the object is illuminated with light;

    determining a reflectivity of the object from the intensity of the reflected light and a reference intensity for the reflected light; and

    determining the temperature of the object from an emissivity obtained from the reflectivity of the object and the intensity of the light radiated from the object, wherein a wavelength band at the time of detecting the intensity of the reflected light is the same as that at the time of detecting the intensity of the light radiated from the object.

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