Apparatus for the synthesis of layers, coatings or films

• US 6,787,012 B2
• Filed: 09/20/2001
• Issued: 09/07/2004
• Est. Priority Date: 09/20/2001
• Status: Expired due to Fees

• Current Assignee: HelioVolt Corporation
• Original Assignee: HelioVolt Corporation
• Inventors: Stanbery, Billy J.
• Primary Examiner(s): MCDONALD, RODNEY GLENN
• Application Number:
  US09/957,125
• Publication Number:
  US 20030051664A1
• Time in Patent Office: 1,083 Days
• Field of Search: 204/298.24, 204/298.25, 204/298.23, 118/715, 118/718, 118/719
• US Class Current: 204/298.24
• CPC Class Codes: C23C 14/0005 Separation of the coating from the substrate
• CPC Class Codes: C23C 14/0623 Sulfides, selenides or tellurides
• CPC Class Codes: C23C 14/56 Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
• CPC Class Codes: C23C 16/01 on temporary substrates, e.g. substrates subsequently removed by etching
• CPC Class Codes: C23C 16/305 Sulfides, selenides, or tellurides
• CPC Class Codes: C23C 16/54 Apparatus specially adapted for continuous coating
• CPC Class Codes: C23C 26/00 Coating not provided for in groups C23C2/00 - C23C24/00
• CPC Class Codes: H01L 31/0322 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
• CPC Class Codes: H01L 31/03928 including AIBIIICVI compound, e.g. CIS, CIGS deposited on metal or polymer foils
• CPC Class Codes: H01L 31/1892 methods involving the use of temporary, removable substrates
• CPC Class Codes: Y02E 10/541 CuInSe2 material PV cells
• CPC Class Codes: Y02P 70/50 Manufacturing or production processes characterised by the final manufactured product

Abstract

Systems and methods are described for synthesis of films, coatings or layers. An apparatus includes a first holder; a second holder coupled to the first holder; a linkage coupled to the first holder and the second holder to move the first holder relative to the second holder; a reusable tool coupled to the first holder, the reusable tool including a raised patterned surface; and a release layer coupled to the raised patterned surface of the reusable tool.

Claims

1. An apparatus, comprising:

a first holder;

a second holder coupled to the first holder;

a linkage coupled to the first holder and the second holder to move the first holder relative to the second holder;

a reusable tool coupled to the first holder, the reusable tool including a raised patterned surface; and

a release layer coupled to the raised patterned surface of the reusable tool,

wherein the first holder is selected from the group consisting of a platten, a roller and a conveyor and wherein the first holder is adapted to hold a plurality of reusable tools.

2. An apparatus, comprising:

a first holder;

a second holder coupled to the first holder;

a linkage coupled to the first holder and the second holder to move the first holder relative to the second holder;

a reusable tool coupled to the first holder, the reusable tool including a raised patterned surface;

a release layer coupled to the raised patterned surface of the reusable tool; and

a heater coupled to the first holder,

wherein the heater can establish a temperature within a precursor layer that can be coupled to the second holder, between the release layer and the second holder, of from approximately 520°

C. to approximately 635°

C.

3. An apparatus, comprising:

a first holder;

a second holder coupled to the first holder;

a linkage coupled to the first holder and the second holder to move the first holder relative to the second holder;

a reusable tool coupled to the first holder, the reusable tool including a raised patterned surface;

a release layer coupled to the raised patterned surface of the reusable tool; and

a heater coupled to the first holder,

wherein the heater applies an electrical bias to the reusable tool while simultaneously passing a current pulse through the reusable tool laterally.

4. An apparatus, comprising:

a first holder;

a second holder coupled to the first holder;

a linkage coupled to the first holder and the second holder to move the first holder relative to the second holder;

a reusable tool coupled to the first holder, the reusable tool including a raised patterned surface;

a release layer coupled to the raised patterned surface of the reusable tool; and

a heater coupled to the first holder,

wherein the heater includes an electrically biased, heated piston that can be brought into contact with the first holder.

5. An apparatus, comprising:

a first holder;

a second holder coupled to the first holder;

a linkage coupled to the first holder and the second holder to move the first holder relative to the second holder;

a reusable tool coupled to the first holder, the reusable tool including a raised patterned surface;

a release layer coupled to the raised patterned surface of the reusable tool; and

a heater coupled to the first holder,

wherein the heater radiatively heats the first holder to a reaction temperature while simultaneously biasing the reusable tool via an electrical contact that is coupled to the reusable tool.

6. An apparatus, comprising:

a first holder;

a second holder coupled to the first holder;

a linkage coupled to the first holder and the second holder to move the first holder relative to the second holder;

a reusable tool coupled to the first holder, the reusable tool including a raised patterned surface; and

a release layer coupled to the raised patterned surface of the reusable tool,

wherein the release layer includes at least one fluoride selected from the group consisting of CaF₂ and SrF₂.

7. An apparatus, comprising:

a first holder;

a second holder coupled to the first holder;

a linkage coupled to the first holder and the second holder to move the first holder relative to the second holder;

a reusable tool coupled to the first holder, the reusable tool including a raised patterned surface;

a release layer coupled to the raised patterned surface of the reusable tool; and

a circuit coupled to the first holder and the second holder to apply an electrostatic field across the first holder and the second holder.

8. The apparatus of claim 7, wherein the circuit can apply an electrostatic field strength of from approximately 0.03 volts/micron to approximately 3.5 volts/micron.

9. The apparatus of claim 8, wherein the electrostatic field strength can be from approximately 0.3 volts/micron to approximately 1.0 volts/micron.