Method of manufacturing a micro-electromechanical fluid ejecting device
First Claim
1. A method of manufacturing a micro-electromechanical fluid ejecting device that includes a plurality of nozzle arrangements, each nozzle arrangement defining a nozzle chamber and a pair of fluid ejection ports in fluid communication with the nozzle chamber and a fluid ejecting mechanism operatively positioned with respect to the nozzle chamber to selectively eject fluid from either of the fluid ejection ports, the method comprising the steps of:
- partially forming the plurality of nozzle chambers within a wafer substrate;
depositing at least one sacrificial layer on the wafer substrate;
forming at least part of each fluid ejecting mechanism on the, or one of the, sacrificial layers; and
etching the, or each, sacrificial layer to free the fluid ejecting mechanisms.
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Accused Products
Abstract
A method of manufacturing a micro-electromechanical fluid ejecting device includes the step of forming a plurality of nozzle chambers on a wafer substrate. Sacrificial layers are deposited on the wafer substrate. A plurality of fluid ejecting mechanisms is formed on the sacrificial layers to be operatively positioned with respect to the nozzle chambers. The sacrificial layers are etched to free the fluid ejecting mechanisms. The fluid ejecting mechanisms are formed so that they are capable of ejecting fluid through both of a pair of fluid ejection ports defined in a roof of each nozzle chamber on one cycle of operation of the fluid ejecting mechanism.
33 Citations
4 Claims
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1. A method of manufacturing a micro-electromechanical fluid ejecting device that includes a plurality of nozzle arrangements, each nozzle arrangement defining a nozzle chamber and a pair of fluid ejection ports in fluid communication with the nozzle chamber and a fluid ejecting mechanism operatively positioned with respect to the nozzle chamber to selectively eject fluid from either of the fluid ejection ports, the method comprising the steps of:
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partially forming the plurality of nozzle chambers within a wafer substrate;
depositing at least one sacrificial layer on the wafer substrate;
forming at least part of each fluid ejecting mechanism on the, or one of the, sacrificial layers; and
etching the, or each, sacrificial layer to free the fluid ejecting mechanisms. - View Dependent Claims (2, 3, 4)
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Specification