Microfluidic devices and manufacture thereof
First Claim
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1. A method for forming a planar microfluidic device which comprises:
- a. forming a laminate structure comprising a negative photoresist matrix layer and a non-silicon planar substrate layer, b. forming on the matrix layer side of the laminate a radiation resistant mask over at least one area defining a desired cavity in the matrix layer, c. exposing the matrix side of the laminate structure to radiation to render the exposed portions resistant to etching, d. developing the matrix layer to form a cavity extending into the laminate structure from the matrix layer side to the interface and e. laminating to the laminate structure on the matrix side a membrane layer covering the cavity, whereby to form a chamber in the structure.
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Abstract
Planar microfluidic devices are laminate structures having a matrix layer at an upper side laminated at an interface to a lower substrate layer. The structure has one or more cavities extending from the upper side to the interface. A membrane is laminated on the upper side of the structure thereby to form a fluid barrier for the cavities. Devices for use as electrochemical sensors further include an electrode at the laminate structure interface below the matrix layer cavity and a well through the substrate layer below the electrode for electrical communication.
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Citations
10 Claims
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1. A method for forming a planar microfluidic device which comprises:
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a. forming a laminate structure comprising a negative photoresist matrix layer and a non-silicon planar substrate layer, b. forming on the matrix layer side of the laminate a radiation resistant mask over at least one area defining a desired cavity in the matrix layer, c. exposing the matrix side of the laminate structure to radiation to render the exposed portions resistant to etching, d. developing the matrix layer to form a cavity extending into the laminate structure from the matrix layer side to the interface and e. laminating to the laminate structure on the matrix side a membrane layer covering the cavity, whereby to form a chamber in the structure. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of constructing an electrochemical cell comprised of a laminated film substrate, comprising:
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a. forming a radiation-opaque electrode on a first surface of a first flexible negative photoresist, b. laminating a second flexible negative photoresist to the first photoresist at the first surface of the first photoresist, thereby forming an interface between the first and second photoresists at the first surface of the first photoresist, c. forming a mask on the side of the second photoresist remote from the interface between the first and second photoresists that aligned with the electrode and covering a portion thereof, d. exposing the second photoresist to radiation from the side opposed to the interface between the first and second photoresists, e. developing the photoresists, whereby to etch a well through the second photoresist to the electrode and a larger well beneath the electrode, extending through the first photoresist. - View Dependent Claims (8, 9, 10)
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Specification