Substrate processing apparatus and semiconductor device producing method
First Claim
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1. A substrate processing apparatus, comprising:
- a processing chamber which processes a substrate;
a substrate supporting body which supports said substrate in said processing chamber;
a heating member which heats said substrate and which is disposed on an opposite side from said substrate with respect to said substrate supporting body;
a substrate temperature detecting device provided at a position opposed to a surface of said substrate; and
a light-shielding member which shields stray light from said heating member and which is disposed around said substrate, wherein said light-shielding member has quartz members and an opaque member sandwiched between said quartz members.
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Abstract
A substrate processing apparatus includes a processing chamber which processes a substrate; a substrate supporting body which supports the substrate in the processing chamber; a heating member which heats the substrate and which is disposed on an opposite side from the substrate with respect to the substrate supporting body; a substrate temperature detecting device provided at a position opposed to a surface of the substrate; and a light-shielding member which shields stray light from the heating member and which is disposed around the substrate, wherein the light-shielding member has quartz members and an opaque member sandwiched between the quartz members.
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Citations
7 Claims
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1. A substrate processing apparatus, comprising:
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a processing chamber which processes a substrate;
a substrate supporting body which supports said substrate in said processing chamber;
a heating member which heats said substrate and which is disposed on an opposite side from said substrate with respect to said substrate supporting body;
a substrate temperature detecting device provided at a position opposed to a surface of said substrate; and
a light-shielding member which shields stray light from said heating member and which is disposed around said substrate, wherein said light-shielding member has quartz members and an opaque member sandwiched between said quartz members. - View Dependent Claims (2, 3, 4, 5, 6)
said substrate supporting body comprises said quartz members. -
3. A substrate processing apparatus as recited in claim 1, wherein
said opaque member is a coating of a material selected from the group consisting of SiC and Si. -
4. A substrate processing apparatus as recited in claim 1, wherein
said opaque member is a SiC plate. -
5. A substrate processing apparatus as recited in claim 1, wherein
said light-shielding member is provided at a portion of said substrate supporting body other than a region thereof where said substrate is placed. -
6. A semiconductor device producing method, comprising producing a semiconductor device using a substrate processing apparatus as recited in claim 1.
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7. A semiconductor device producing method, comprising:
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mounting a substrate on a substrate supporting body disposed in a processing chamber;
heating said substrate by a heating member disposed on a first main surface side of said substrate;
monitoring a temperature of said substrate by a substrate temperature detecting device provided at a side of a second main surface of said substrate opposed to said first main surface of said substrate; and
shielding stray light from said heating member to said substrate temperature detecting device by a light-shielding member which includes quartz members and an opaque member sandwiched between said quartz members and which is disposed around said substrate.
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Specification