Semiconductor light emission device and manufacturing method thereof
First Claim
1. A semiconductor light emitting device comprising:
- a substrate; and
a multi-layer semiconductor film formed on the substrate, the multi-layer semiconductor film including a plurality of semiconductor layers overlaid on the substrate, the semiconductor layers having a light emission layer for emitting a light, wherein the light is picked up at a first side of the multi-layer semiconductor film, which is a side opposite to the substrate, wherein a pattern having a light pickup surface is formed on a light emitting portion of the multi-layer semiconductor film, the light pickup surface is in a (111) plane or a plane in a vicinity of the (111) plane but not in a (100) plane, and an unevenness is formed on the light pickup surface.
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Abstract
A semiconductor light emitting device is disclosed, which comprises a substrate, and a multi-layer semiconductor film formed on the substrate, the multi-layer semiconductor film including a plurality of semiconductor layers overlaid on the substrate, the semiconductor layers having a light emission layer for emitting a light, wherein the light is picked up at a first side of the multi-layer semiconductor film, which is a side opposite to the substrate, wherein a pattern having a light pickup surface is formed on a light emitting portion of the multi-layer semiconductor film, the light pickup surface is in a (111) plane or a plane in the vicinity of the (111) plane, and an unevenness is formed on the light pickup surface.
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Citations
17 Claims
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1. A semiconductor light emitting device comprising:
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a substrate; and
a multi-layer semiconductor film formed on the substrate, the multi-layer semiconductor film including a plurality of semiconductor layers overlaid on the substrate, the semiconductor layers having a light emission layer for emitting a light, wherein the light is picked up at a first side of the multi-layer semiconductor film, which is a side opposite to the substrate, wherein a pattern having a light pickup surface is formed on a light emitting portion of the multi-layer semiconductor film, the light pickup surface is in a (111) plane or a plane in a vicinity of the (111) plane but not in a (100) plane, and an unevenness is formed on the light pickup surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
blading a light pickup surface formed of the (100) plane to expose the (111) plane or the plane in the vicinity of the (111) plane; and
carrying out a rough surface processing on the (111) plane exposed or the crystal plane exposed in the vicinity of the (111) plane to form the unevenness.
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10. The method of manufacturing a semiconductor light emitting device, according to claim 9, wherein the rough surface processing is carried out by dry etching the light pickup surface using a halogen-base gas.
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11. The method of manufacturing a semiconductor light emitting device, according to claim 9, wherein the rough surface processing is carried out by wet etching the light pickup surface.
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12. The method of manufacturing a semiconductor light emitting device, according to claim 9, wherein the rough surface processing is carried out by heat-treating the light pickup surface in an HCl atmosphere.
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13. A method of manufacturing a semiconductor light emitting device according to claim 1, comprising:
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forming a line-and-space mask on a light pickup surface of the (100) plane;
reactive ion etching the light pickup surface into a tapered form using the mask to expose the (111) plane; and
carrying out rough surface processing on the (111) plane exposed to form the unevenness.
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14. The method of manufacturing a semiconductor light emitting device, according to claim 13, wherein the rough surface processing is carried out by dry etching the light pickup surface using a halogen-base gas.
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15. The method of manufacturing a semiconductor light emitting device, according to claim 13, wherein the rough surface processing is carried out by wet etching the light pickup surface.
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16. The method of manufacturing a semiconductor light emitting device, according to claim 13, wherein the rough surface processing is carried out by heat-treating the light pickup surface in an HCl atmosphere.
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17. The semiconductor light emitting device according to claim 1, wherein a plurality of patterns formed on the light pickup portion are arranged in a form of a line-and-space.
Specification