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Metrology diffraction signal adaptation for tool-to-tool matching

  • US 6,792,328 B2
  • Filed: 03/29/2002
  • Issued: 09/14/2004
  • Est. Priority Date: 03/29/2002
  • Status: Active Grant
First Claim
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1. A method in integrated circuit astrology for adapting a metrology system to work with diverse astrology devices, the method comprising:

  • measuring a set of sites on a wafer utilizing a first metrology device, the measurement generating a first set of diffraction signals, the first astrology device having identifying specifications;

    measuring the set of sites on the wafer utilizing a second metrology device, the measurement generating a second set of diffraction signals, the second metrology device having identifying specifications;

    calculating differences between each signal of the first set of diffraction signals and the corresponding signal of the second set of diffraction signals; and

    determining a signal adjustment vector from the calculated differences, the signal adjustment vector configured to enable metrology data created for the first metrology device to be used in the second astrology device.

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