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Method and apparatus for inspecting defects in a semiconductor wafer

  • US 6,792,367 B2
  • Filed: 03/28/2002
  • Issued: 09/14/2004
  • Est. Priority Date: 12/11/2001
  • Status: Expired due to Fees
First Claim
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1. In a semiconductor wafer inspection system, a computer program product for providing a user interface for making an inspection of a semiconductor wafer, said semiconductor wafer having a plurality of defects, at least some of said defects forming one or more clusters, the system comprising:

  • a computer usable medium having computer readable program code;

    said computer readable program code suitable for execution on a computer and comprising;

    first executable program code effective for operating said computer to present one or more first information reception areas for receiving information relating to statistical criteria;

    second executable program code effective for operating said computer to present one or more second information reception areas for receiving information indicative of a selection of one or more of said clusters; and

    third executable program code effective for operating said computer to receive first sampling information or second sampling information, said first sampling information comprising first statistical criteria, said second sampling information comprising one or more user-selected clusters, each user-selected cluster having associated second statistical criteria, wherein if said first sampling information is received, a statistically-based sampling of first defects from said plurality of defects is made based on said first statistical criteria and an inspection is made on each of said first defects, wherein if said second sampling information is received, a statistically-based sampling of second defects from each user-selected cluster is made based on its associated second statistical criteria and an inspection is made on each of said second defects.

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