Methods of forming quantum dots of Group IV semiconductor materials
First Claim
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1. A method of forming a quantum dot, comprising:
- providing a particle that includes a semiconductor material Y selected from the group consisting of Si and Ge; and
applying sound energy and light energy to said particle to form a quantum dot that exhibits photoluminescence with a quantum efficiency that is greater than 10 percent, said quantum dot including a core, said core including Y.
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Abstract
The invention relates to a method of forming a quantum dot. A particle that includes a semiconductor material Y selected from the group consisting of Si and Ge is provided. Sound energy and light energy is applied to the particle to form a quantum dot. The quantum dot exhibits photoluminescence with a quantum efficiency that is greater than 10 percent. The quantum dot includes a core, and the core includes Y.
274 Citations
25 Claims
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1. A method of forming a quantum dot, comprising:
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providing a particle that includes a semiconductor material Y selected from the group consisting of Si and Ge; and
applying sound energy and light energy to said particle to form a quantum dot that exhibits photoluminescence with a quantum efficiency that is greater than 10 percent, said quantum dot including a core, said core including Y. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
forming a porous layer on a substrate, said substrate including Y; and
processing said porous layer to form said particle.
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4. The method of claim 1, further comprising:
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dispersing said particle in a solvent, and wherein applying said sound energy and said light energy to said particle includes applying said sound energy and said light energy to said particle in said solvent.
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5. The method of claim 1, wherein applying said sound energy and said light energy to said particle includes:
applying said sound energy to said particle for a time sufficient to form said core with a diameter within a predetermined range.
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6. The method of claim 1, wherein applying said sound energy and said light energy to said particle includes:
applying said sound energy to said particle for a time sufficient to form a shell surrounding said core.
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7. The method of claim 6, wherein said shell includes an oxide YOn with n being between approximately 0 and 2.
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8. The method of claim 6, wherein said shell is substantially defect free.
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9. The method of claim 1, wherein applying said sound energy and said light energy to said particle includes:
applying said light energy to said particle for a time sufficient to form said core with a diameter within a predetermined range.
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10. A method of forming quantum dots, comprising:
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providing particles having a first peak size, said particles including a semiconductor material Y selected from the group consisting of Si and Ge; and
applying light energy to said particles for a time sufficient to form quantum dots having a second peak size, said second peak size being smaller than said first peak size. - View Dependent Claims (11, 12, 13)
selecting said wavelength based on said second peak size.
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12. The method of claim 10, wherein applying said light energy to said particles includes:
applying said light energy to said particles for a time sufficient to form said quantum dots having sizes exhibiting less than 20 percent root-mean-square deviation.
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13. The method of claim 10, wherein each quantum dot includes a core and a shell surrounding said core, said core including Y, said shell including an oxide YOn with n being between approximately 0 and 2, said method further comprising:
applying sound energy to said particles for a time sufficient to form said shell.
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14. A method of forming a quantum dot, comprising:
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reacting, in a reaction medium, a source of a semiconductor material Y selected from the group consisting of Si and Ge with a reducing agent to form a particle that includes a core, said core including Y, said reducing agent being selected from the group consisting of Group IIA metals, transition metals, and lanthanides; and
reacting said particle with a source of surface ligands to form a ligand layer surrounding said core to form a quantum dot, said ligand layer including at least one surface ligand. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
mixing said source of Y and said reducing agent in said reaction medium.
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16. The method of claim 14, wherein reacting said source of Y with said reducing agent includes:
mixing said source of Y and said reducing agent in said reaction medium at a pressure of approximately 1 atm.
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17. The method of claim 14, wherein reacting said source of Y with said reducing agent includes:
maintaining said reaction medium at a temperature between approximately −
79°
C. and 300°
C.
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18. The method of claim 14, wherein reacting said source of Y with said reducing agent includes:
maintaining said reaction medium at a temperature between approximately 60°
C. and 280°
C.
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19. The method of claim 14, wherein said source of Y includes a compound having a structure given by the formula:
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YXa,where a is an integer in the range of 2 to 4, and X is selected from the group consisting of —
F, —
Cl, —
Br, —
I, —
O—
CO—
R(1), —
NR(2)R(3), —
OR(4), and —
S—
R(5), with R(1), R(2), R(3), R(4), and R(5) being independently selected from the group consisting of alkyls, alkenyls, alkynyls, and aryls.
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20. The method of claim 14, wherein said reducing agent is selected from the group consisting of Be, Mg, Ca, Sr, Ba, Sc, Ti, Zr, Mn, Fe, Co, Ni, Pd, Cu, Zn, Ce, and Sm.
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21. The method of claim 14, further comprising:
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providing said reducing agent in a powdered form; and
dispersing said reducing agent in said powdered form in said reaction medium.
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22. The method of claim 14, wherein said reaction medium includes two different coordinating solvents.
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23. The method of claim 14, wherein said reaction medium includes a solvent selected from the group consisting of oxygen-containing organic solvents, nitrogen-containing organic solvents, sulfur-containing organic solvents, and phosphorus-containing organic solvents.
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24. The method of claim 14, wherein said source of surface ligands includes an organometallic compound.
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25. The method of claim 24, wherein said organometallic compound has a structure given by the formula:
Specification