Oxidation process to improve polysilicon sidewall roughness
First Claim
Patent Images
1. A method of reducing surface roughness of sidewalls of a created gate electrode, comprising steps of:
- providing a semiconductor substrate;
forming a layer of gate electrode material over said substrate;
initiating and partially completing etching said layer of gate electrode material;
then initiating a step of oxidation of said partially etched layer of gate electrode material; and
continuing and completing patterning said layer of gate electrode material.
1 Assignment
0 Petitions
Accused Products
Abstract
A new step is provided for the creation of polysilicon gate electrode structures. A layer of polysilicon is deposited over the surface of a layer of semiconductor material, the layer of polysilicon is etched using a layer of hardmask material for this purpose. The etch of the layer of polysilicon is performed using a dual power source plasma system. During the etching of the layer of polysilicon, a step of inert oxidation is inserted. This step forms a layer of passivation over the sidewalls of the etched layer of polysilicon. The step of inert oxidation is an oxygen-based plasma exposure.
125 Citations
48 Claims
-
1. A method of reducing surface roughness of sidewalls of a created gate electrode, comprising steps of:
-
providing a semiconductor substrate;
forming a layer of gate electrode material over said substrate;
initiating and partially completing etching said layer of gate electrode material;
theninitiating a step of oxidation of said partially etched layer of gate electrode material; and
continuing and completing patterning said layer of gate electrode material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
successively creating over said substrate first a layer of gate oxide over which a layer of gate electrode material is deposited over which a layer of hardmask material is deposited; and
patterning said layer of hardmask material, creating an etch mask for etching said layer of gate electrode material.
-
-
19. The method of claim 1, said continuing and completing patterning said layer of gate electrode material comprising concurrently continuing said step of oxidation, creating an etched layer of gate electrode material over sidewalls of which a layer of oxide has been deposited.
-
20. A method of reducing surface roughness of sidewalls of a gate electrode, comprising steps of:
-
providing a semiconductor substrate, said substrate having been provided with first a layer of gate electrode oxide over the surface thereof over which second a layer of gate electrode material has been deposited over which third a mask of hardmask material has been created;
initiating and partially completing etching said layer of gate electrode material in accordance with said mask of hardmask material using a dual power source plasma system;
theninitiating a step of oxidation using said dual power source plasma system; and
continuing and completing etching said layer of gate electrode material while concurrently continuing said step of oxidation, creating an etched layer of gate electrode material over sidewalls of which a layer of oxide has been deposited. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
-
-
36. A method of reducing roughness in sidewalls of a polysilicon gate electrode, comprising steps of:
-
providing a semiconductor substrate, said substrate having been provided with first a layer of gate oxide over the surface thereof over which second a layer of polysilicon has been deposited over which third a mask of hardmask material has been created;
initiating and partially completing etching said layer of polysilicon in accordance with said mask of hardmask material using a dual power source plasma system;
initiating a step of oxidation using said dual power source plasma system; and
continuing and completing etching said layer of polysilicon while concurrently continuing said step of oxidation, creating an etched layer of polysilicon over sidewalls of which a layer of oxide has been deposited. - View Dependent Claims (37, 38, 39, 40, 41, 42)
-
-
43. A method of reducing surface roughness in sidewalls of a polysilicon gate electrode, comprising steps of:
-
providing a semiconductor substrate, said substrate having been provided with first a layer of gate oxide over the surface thereof over Which second a layer of polysilicon has been deposited over which third a mask of hardmask material has been created;
initiating and partially completing etching said layer of polysilicon in accordance with said mask of hardmask material using a dual power source plasma system;
initiating a step of oxidation comprising an oxygen based plasma exposure using said dual power source plasma system; and
continuing and completing etching said layer of polysilicon while concurrently continuing said step of oxidation, creating an etched layer of polysilicon over sidewalls of which layers of oxide have been deposited. - View Dependent Claims (44, 45, 46, 47, 48)
-
Specification