Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus

• US 6,795,169 B2
• Filed: 03/07/2003
• Issued: 09/21/2004
• Est. Priority Date: 06/30/1993
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Tanaka, Masashi, Kato, Masaki, Chiba, Hiroshi, Shirasu, Hiroshi, Kato, Kinya, Kumazawa, Masato
• Primary Examiner(s): FULLER, RODNEY EVAN
• Application Number:
  US10/382,874
• Publication Number:
  US 20030137644A1
• Time in Patent Office: 564 Days
• Field of Search: 355/46, 355/53, 355/67
• US Class Current: 355/67
• CPC Class Codes: G02B 13/22 Telecentric objectives or lens systems
• CPC Class Codes: G02B 17/002 Arrays of reflective systems
• CPC Class Codes: G02B 17/008 Systems specially adapted to form image relays or chained systems
• CPC Class Codes: G02B 17/045 having static image erecting or reversing properties only optical derotators G02B27/642; optical devices for controlling the direction of light using movable or deformable optical elements G02B26/08
• CPC Class Codes: G02B 17/0605 using two curved mirrors G02B17/0668, G02B17/0694 take precedence
• CPC Class Codes: G02B 17/08 Catadioptric systems used in non-imaging applications G02B19/00
• CPC Class Codes: G02B 17/0812 off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
• CPC Class Codes: G02B 17/082 using three curved mirrors G02B17/0864, G02B17/0896 take precedence
• CPC Class Codes: G02B 17/0828 off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
• CPC Class Codes: G02B 17/086 wherein the system is made of a single block of optical material, e.g. solid catadioptric systems
• CPC Class Codes: G02B 17/0892 specially adapted for the UV
• CPC Class Codes: G02B 27/144 using partially transparent surfaces without spectral selectivity G02B27/147 takes precedence
• CPC Class Codes: G02B 27/145 having sequential partially reflecting surfaces
• CPC Class Codes: G03B 27/32 Projection printing apparatus, e.g. enlarger, copying camera
• CPC Class Codes: G03F 7/70066 Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
• CPC Class Codes: G03F 7/70216 Mask projection systems
• CPC Class Codes: G03F 7/70225 Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
• CPC Class Codes: G03F 7/70241 Optical aspects of refractive lens systems, i.e. comprising only refractive elements
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/70791 : Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Abstract

An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.

Claims

1. An exposure apparatus comprising:

a plurality of projection optical systems, each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate; and

a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line;

wherein the plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.

2. The exposure apparatus according to claim 1, wherein each of the projection optical systems is substrate side telecentric.

3. The exposure apparatus according to claim 2, further comprising an illumination system which supplies illumination light to the plurality of projection optical systems.

4. The exposure apparatus according to claim 2, wherein the plurality of exposure fields are aligned in first and second columns extending in a direction crossing the scanning direction, and the first and second columns are aligned with different positions in the scanning direction.

5. The exposure apparatus according to claim 4, wherein each of the projection optical systems has a field of view, and the plurality of fields of view are arranged at different positions on a mask.

6. The exposure apparatus according to claim 5, wherein the mask is movable in the scanning direction.

12. The exposure apparatus according to claim 1, wherein the projection optical systems each having projection error corrector which is disposed in an optical path of the projection optical system and which corrects an optical error of the projection optical system.

13. The exposure apparatus according to claim 12, wherein the optical error of the projection optical system includes an error due to environmental changes.

14. The exposure apparatus according to claim 12, wherein the optical error of the projection optical system includes at least one of a magnification error and an image position error.

7. An exposure method comprising the steps of:

forming a plurality of exposure fields using a plurality of projection optical systems, each of the projection optical systems projects a predetermined pattern onto a substrate; and

exposing the pattern onto the substrate while moving the substrate along at least a scanning direction extending in a straight line;

wherein the plurality of exposure fields are aligned in a direction crossing the scanning direction.

8. The exposure method according to claim 7, wherein each of the projection optical systems is substrate side telecentric.

9. The exposure method according to claim 8, wherein the plurality of exposure fields are aligned in first and second columns extending in a direction crossing the scanning direction, and the first and second columns are aligned with different positions in the scanning direction.

10. The exposure method according to claim 9, wherein each of the projection optical systems has a field of view, and the plurality of fields of view are arranged at different positions on a mask.

11. The exposure method according to claim 10, wherein the mask is movable in the scanning direction.

15. The exposure method according to claim 7, further comprising a step of correcting an optical error of the projection optical system.

16. The exposure method according to claim 15, wherein the optical error of the projection optical system includes an error due to environmental changes.

17. The exposure method according to claim 15, wherein the optical error of the projection optical system includes at least one of a magnification error and an image position error.

18. An image projection apparatus comprising:

at least one light source;

a plurality of illumination optical systems;

a plurality of projection optical systems, each of the projection optical systems projecting a predetermined pattern onto a predetermined plane based on a light from one of the plurality illumination optical systems; and

a light guide arranged along an optical path between the at least one light source and the plurality of illumination optical systems, and having at least one input end which optically connects to the at least one light source and a plurality of output ends, wherein each of the plurality of output ends optically connects to one of the plurality of illumination optical systems.

19. The image projection apparatus according to claim 18, wherein the at least one light source comprises a plurality of light sources.

20. The image projection apparatus according to claim 19, wherein the projected predetermined patterns partially overlap each other.

21. The image projection apparatus according to claim 18, wherein the predetermined pattern is arranged along an optical path between the illumination optical system and the corresponding projection optical system.