Scatterometer including an internal calibration system

• US 6,795,193 B2
• Filed: 11/26/2002
• Issued: 09/21/2004
• Est. Priority Date: 05/31/2002
• Status: Expired due to Fees

• Current Assignee: GlobalFoundries, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Schulz, Bernd
• Primary Examiner(s): STAFIRA, MICHAEL PATRICK
• Application Number:
  US10/304,572
• Publication Number:
  US 20030223072A1
• Time in Patent Office: 665 Days
• Field of Search: 356/445-448, 356/237--23, 356/244, 250/306, 250/307, 250/310, 250/311, 250/252.1, 250/372
• US Class Current: 356/445
• CPC Class Codes: G01N 21/47 Scattering, i.e. diffuse reflection G01N21/25, G01N21/41 take precedence G01N21/55 takes precedence
• CPC Class Codes: G01N 21/93 Detection standards; Calibrating baseline adjustment, drift correction
• CPC Class Codes: G01N 21/9501 Semiconductor wafers manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G01N 21/956 Inspecting patterns on the surface of objects contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10

Abstract

A scatterometer system comprises a pitch calibration station that allows the monitoring of a tool status of the scatterometry system without involving a user'"'"'s interaction. The pitch calibration station comprises a pitch calibration standard, for example in the form of a grid pattern that may conveniently be evaluated on the basis of a reference data library. By providing the pitch calibration station, the measurement process may easily be adapted to include reference measurements on a regular basis so as to increase the reliability of measurement values obtained by scatterometry. In one particular example, a corresponding set of instructions for performing the calibration measurement may be implemented into a self-test routine of the scatterometry system.

Claims

1. A scatterometry system comprising:

a light source configured to emit a light beam of predefined optical characteristics;

a detector configured to receive a light beam and output a signal indicative of optical characteristics of the received light beam;

a substrate holder configured to receive and position a substrate so as to receive the light beam from said light source and scatter a portion of the light beam to said detector; and

a pitch calibration station including a pitch calibration standard to provide measurement data indicative of the current system status.

2. The scatterometry system of claim 1, further comprising a reference data unit to provide reference data describing the pitch calibration standard.

3. The scatterometry system of claim 2, wherein the reference data unit comprises a storage unit to receive and store the reference data.

4. The scatterometry system of claim 1, further comprising a beam positioning assembly configured to alternatively position said pitch calibration standard and said substrate holder so as to receive the light beam emitted by said light source.

5. The scatterometry system of claim 4, wherein the beam positioning assembly comprises a drive assembly coupled to said substrate holder and said pitch calibration station.

6. The scatterometry system of claim 4, wherein the beam positioning assembly comprises a drive assembly configured to move said light source and said detector to alternatively provide a light beam emitted by the light source to said pitch calibration standard and the substrate holder.

7. The scatterometry system of claim 3, wherein the beam positioning assembly comprises a plurality of reflective elements arranged to alternatively direct the light beam emitted by the light source to the pitch calibration standard and the substrate holder.

8. The scatterometry system of claim 7, wherein one or more of said reflective elements are moveable.

9. The scatterometry system of claim 1, wherein said pitch calibration standard comprises a grating structure.

10. The scatterometry system of claim 1, further comprising a storage unit configured to store a measurement data obtained from said pitch calibration station.

11. A method of monitoring a status of a scatterometry system, the method comprising:

providing a pitch calibration standard;

establishing a reference data library for said pitch calibration standard;

obtaining measurement data of said pitch calibration standard; and

comparing said measurement data with said reference data library to assess the status of the scatterometry system.

12. The method of claim 11, wherein obtaining measurement data of said pitch calibration standard is carried out upon occurrence of at least one of the following situations:

an initialization of the scatterometry system, an elapse of a predefined time interval, a completion of a predefined number of measurement cycles and an external request for a calibration measurement.

13. The method of claim 11, wherein obtaining measurement data and comparing said measurement data with the reference data library is carried out during a self-test routine of the scatterometry system.

14. The method of claim 11, wherein comparing the measurement data with the reference data library includes assessing whether a difference of the reference data and the measurement data is within a predefined allowable range.

15. The method of claim 14, further comprising indicating an invalid tool status when said difference is outside of said predefined allowable range.

16. The method of claim 14, further comprising storing a value indicative of said difference to establish a tool history.

17. The method of claim 11, wherein said light source, said detector and said substrate holder are provided in the form of one of an ellipsometer and a photometer.

18. The method of claim 11, wherein said pitch calibration standard is a grid pattern.

19. The method of claim 16, wherein establishing said tool history includes determining at least one of an average value and a standard deviation of a plurality of values indicative of differences between measurement data and the reference data library of previously performed measurements with said pitch calibration standard.

20. The method of claim 19, wherein said reference data library is updated on the basis of the tool history.

21. The method of claim 16, wherein one or more correction values are established on the basis of the tool history.

22. A method of operating a scatterometer, the method comprising:

starting a self-test routine of the scatterometer, the self-test routine including;

obtaining measurement data from a pitch calibration standard;

comparing said measurement data with reference data characterizing the pitch calibration standard; and

indicating that the scatterometer is acceptable for performing measurements when a result of said comparison is within a predefined allowable range.

23. The method of claim 22, wherein said self-test routine is started upon occurrence of at least one of the following events:

an initialization of the scatterometer, an external request, an elapse of a predefined time interval and a completion of a predefined number of measurement cycles.

24. The method of claim 22, further comprising storing said comparison result to establish a tool history.

25. The method of claim 24, further comprising updating said reference data on the basis of the tool history.

26. The method of claim 25, further comprising measuring a substrate and evaluating measurement data of said substrate on the basis of substrate reference data and said tool history.

27. The method of claim 22, further comprising indicating an invalid tool status when said comparison result is outside of a predefined allowable range.