Method and apparatus for an improved optical window deposition shield in a plasma processing system
First Claim
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1. An optical window deposition shield for accessing a process space through a deposition shield in a plasma processing system comprising:
- a plug configured to provide optical access through said deposition shield, said plug comprises a frontal surface and a perimeter surface;
a flange coupled to said plug and configured to couple said optical window deposition shield to at least one of the deposition shield and a chamber wall of the plasma processing system, said flange comprising a first surface, a second surface, and an edge surface, wherein a portion of said first surface comprises a mating surface; and
a protective barrier coupled to a plurality of exposed surfaces of said optical window deposition shield, wherein the plurality of exposed surfaces comprise said frontal surface of said plug, said perimeter surface of said plug, and said first surface of said flange excluding said mating surface.
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Abstract
The present invention presents an improved optical window deposition shield an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
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Citations
40 Claims
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1. An optical window deposition shield for accessing a process space through a deposition shield in a plasma processing system comprising:
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a plug configured to provide optical access through said deposition shield, said plug comprises a frontal surface and a perimeter surface;
a flange coupled to said plug and configured to couple said optical window deposition shield to at least one of the deposition shield and a chamber wall of the plasma processing system, said flange comprising a first surface, a second surface, and an edge surface, wherein a portion of said first surface comprises a mating surface; and
a protective barrier coupled to a plurality of exposed surfaces of said optical window deposition shield, wherein the plurality of exposed surfaces comprise said frontal surface of said plug, said perimeter surface of said plug, and said first surface of said flange excluding said mating surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method of producing an optical window deposition shield for a deposition shield in a plasma processing system, said method comprising:
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fabricating said optical window deposition shield, wherein said optical window deposition shield comprises a plug configured to provide optical access through said deposition shield, said plug comprises a frontal surface and a perimeter surface, and a flange coupled to said plug and configured to couple said optical window deposition shield to at least one of the deposition shield and a chamber wall of the plasma processing system, said flange comprising a first surface, a second surface, and an edge surface, wherein a portion of said first surface comprises a mating surface; and
forming a protective barrier on exposed surfaces, wherein said exposed surfaces comprise said frontal surface of said insert, said perimeter surface of said insert, and said first surface of said flange excluding said mating surface. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40)
anodizing said optical window deposition shield to form a surface anodization layer on said optical window deposition shield; and
removing said surface anodization layer on said exposed surfaces.
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22. The method as recited in claim 21, wherein said removing comprises at least one of machining, smoothing, polishing, and grinding.
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23. The method as recited in claim 20, said method further comprising:
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masking said exposed surfaces on said optical window deposition shield to prevent formation of a surface anodization layer;
anodizing said optical window deposition shield to form a surface anodization layer on the unmasked surfaces of said optical window deposition shield; and
unmasking said exposed surfaces.
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24. The method as recited in claim 20, wherein said fabricating comprises at least one of machining, coating, masking, unmasking, casting, polishing, forging, and grinding.
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25. The method as recited in claim 20, wherein said forming comprises at least one of spraying, heating, and cooling.
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26. The method as recited in claim 20, said method further comprising smoothing said protective barrier.
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27. The method as recited in claim 20, wherein said optical window deposition shield comprises a plurality of fastening receptors coupled to said first surface of said flange and said second surface of said flange and configured to receive fastening devices in order to couple said optical window deposition shield to the at least one of the deposition shield and the chamber wall.
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28. The method as recited in claim 27, wherein each of said plurality of fastening receptors comprises an entrant region, an entrant cavity, an exit through-hole, an interior fastener surface, and a recessed fastener surface.
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29. The method as recited in claim 20, wherein said plurality of exposed surfaces further comprises said mating surface.
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30. The method as recited in claim 20, wherein said optical window deposition shield comprises a metal.
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31. The method as recited in claim 30, wherein said metal comprises aluminum.
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32. The method as recited in claim 20, wherein said optical window deposition shield comprises a rectangular shape.
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33. The method as recited in claim 20, wherein said second surface comprises an anodization layer.
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34. The method as recited in claim 20, wherein said edge surface comprises an anodization layer.
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35. The method as recited in claim 20, wherein said protective barrier comprises a compound containing at least one of a III-column element and a Lanthanon element.
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36. The method as recited in claim 35, wherein said III-column element comprises at least one of Yttrium, Scandium, and Lanthanum.
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37. The method as recited in claim 35, wherein said Lanthanon element comprises at least one of Cerium, Dysprosium, and Europium.
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38. The method as recited in claim 20, wherein said protective barrier comprises at least one of Y2O3, Sc2O3, Sc2F3, YF3, La2O3, CeO2, Eu2 O3, and DyO3.
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39. The method as recited in claim 20, wherein said protective barrier comprises a minimum thickness and said minimum thickness is constant across at least one of said exposed surfaces.
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40. The method as recited in claim 20, wherein said protective barrier comprises a variable thickness and said variable thickness ranging from 0.5 to 500 microns.
Specification