Two chamber F2 laser system with F2 pressure based line selection

• US 6,798,812 B2
• Filed: 09/13/2002
• Issued: 09/28/2004
• Est. Priority Date: 01/23/2002
• Status: Expired due to Fees

• Current Assignee: Cymer Incorporated (ASML Holding NV)
• Original Assignee: Cymer Incorporated (ASML Holding NV)
• Inventors: Rylov, German E., Sandstrom, Richard L., Hofmann, Thomas
• Primary Examiner(s): Ip, Paul
• Assistant Examiner(s): Rodriguez, Armando
• Application Number:
  US10/243,102
• Publication Number:
  US 20030138019A1
• Time in Patent Office: 746 Days
• Field of Search: 372/55, 372/57, 372/58, 372/59, 372/60, 372/61, 372/90
• US Class Current: 372/55
• CPC Class Codes: H01S 3/03 of gas laser discharge tubes
• CPC Class Codes: H01S 3/036 Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube H01S3/031 takes precedence
• CPC Class Codes: H01S 3/09702 Details of the driver electronics and electric discharge circuits
• CPC Class Codes: H01S 3/1055 one of the reflectors being constituted by a diffraction grating
• CPC Class Codes: H01S 3/225 comprising an excimer or exciplex
• CPC Class Codes: H01S 3/2258 F2, i.e. molecular fluoride is comprised for lasing around 157 nm
• CPC Class Codes: H01S 3/2308 Amplifier arrangements, e.g. MOPA

Abstract

The present invention provides an injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to 10 mJ or greater for integrated outputs of about 20 to 40 Watts or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The parameters chamber can be controlled separately permitting optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment is a F₂ laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In this preferred embodiment, both of the chambers and the laser optics are mounted on a vertical optical table within a laser enclosure. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is operated with a fluorine partial pressure and total gas pressure within specified ranges in order to reduce the intensity of the weak line to less than 0.01% of the strong line. Therefore, the need for line selection optical equipment is avoided.

Claims

1. A very narrow band two chamber high repetition rate F₂ gas discharge laser system comprising:

A) a first laser unit comprising;

1) a first discharge chamber containing;

a) a first laser gas comprising fluorine gas defining a fluorine partial pressure and at least one buffer gas wherein said laser gas defines a to gas pressure

b) a first pair of elongated spaced apart electrodes defining a first discharge region,

2) a first fan for producing sufficient gas velocities of said first laser gas in said first discharge region to clear from said first discharge region, following each pulse, substantially all discharge produced ions prior to a next pulse when operating at a repetition rate in the range of 2,000 pulses per second or greater,

3) a first heat exchanger system capable of removing at least 16 kw of heat energy from said first laser gas,

B) a second laser unit comprising;

1) a second discharge chamber containing;

a) a second laser gas,

b) a second pair of elongated spaced apart electrodes defining a second discharge region

2) a second fan for producing sufficient gas velocities of said second laser gas in said second discharge region to clear from said second discharge region, following each pulse, substantially all discharge produced ions prior to a next pulse when operating at a repetition rate in the range of 4,000 pulses per second or greater,

3) a second heat exchanger system capable of removing at least 16 kw of heat energy from said second laser gas,

C) a pulse power system configured to provide electrical pulses to said first pair of electrodes and to said second pair of electrodes sufficient to produce laser pulses at rates of about 4,000 pulses per second with precisely controlled pulse energies in excess of about 5 mJ,

D) a laser beam measurement and control system for measuring pulse energy of laser system output pulses produced by said laser system and controlling said gas discharge laser output pulses in a feedback control arrangement, and

wherein output laser beams from said first laser unit are utilized as a seed beam for seeding said second laser unit and wherein said fluorine partial pressure in said first chamber and said total gas pressure is said first chamber are low enough that spectral intensity of the laser system output pulses at about 157.52 nm is less than 0.5% of spectral intensity of the laser system output pulses at 157.63 nm.

2. A laser system as in claim 1 wherein said first laser unit is configured as a master oscillator and said second laser unit is configured as a power amplifier.

3. A laser system as in claim 2 wherein said first laser gas comprises fluorine and helium.

4. A laser system as in claim 2 wherein said first laser gas comprises fluorine and neon.

5. A laser system as in claim 2 wherein said first and second laser gas comprises fluorine and a buffer gas chosen from a group consisting of neon, helium or a mixture of neon and helium.

6. A laser system as in claim 1 wherein said spectral intensity of the laser system output pulses at about 152.52 is less than 0.01% of the spectral intensity of the laser system output pulses at 157.63 nm.

7. A laser system as in claim 1 wherein said fluorine partial pressure is less than 0.3 kPa and the total laser gas pressure is less than 270 kPa.

8. A laser system as in claim 1 wherein said fluorine partial pressure is less than about 0.2 kPa and the total laser gas pressure is less than about 200 kPa.

9. A laser system as in claim 1 wherein said fluorine partial pressure is about 0.2 kPa and the total laser gas pressure is about 200 kPa.

10. A laser system as m claim 1 wherein said fluorine partial pressure is between 0.05 kPa and 0.3 kPa.

11. A laser system as in claim 1 wherein said total laser gas pressure is between 100 kPa and 270 kPa.

12. A laser system as in claim 1 and further comprising a weak line-strong line monitor for monitoring spectral intensities for the purpose of determining spectral intensity of the laser system output beam at about 157.63 nm relative to intensity of all spectral components the laser system output beam.

13. A laser system as in claim 1 and further comprising a vertically mounted optical table with said first and second discharge chambers mounted on said vertical optical table.

14. A laser as in claim 1 and wherein first and second said chambers each comprises a vane structure downstream of said discharge region for normalizing gas velocity downstream of said discharge region.

15. A laser as in claim 1 wherein said first fan and said second fan each are tangential fans and each comprises a shaft driven by two brushless DC motors.

16. A laser as in claim 15 wherein said motors are water-cooled motors.

17. A laser as in claim 15 wherein each of said motors comprise a stator and each of said motors comprise a magnetic rotor contained in a pressure cup separating a said stator from said laser gas.

18. A laser as in claim 1 wherein said first and second fans are each tangential fans each comprising a blade structure machined from said aluminum stock.

19. A laser as in claim 15 wherein said blade structure has an outside diameter of about five inches.

20. A laser as in claim 19 wherein said blade structures comprise blade elements having sharp leading edges.

21. A laser as in claim 15 wherein said motors are sensorless motors and further comprising a master motor controller for controlling one of said motors and a slave motor controller for controlling the other motor.

22. A laser as in claim 15 wherein each of said tangential fans comprise blades which are angled with respect to said shaft.

23. A laser as in claim 1 wherein each finned heat exchanger system is water cooled.

24. A laser as in claim 23 wherein each heat exchanger system comprises at least four separate water cooled heat exchangers.

25. A laser as in claim 23 wherein each heat exchanger system comprises at least one heat exchanger having a tubular water flow passage wherein at least one turbulator is located in said path.

26. A laser as in claim 25 wherein each of said four heat exchangers comprise a tubular water flow passage containing a turbulator.

27. A laser as in claim 26 wherein said high voltage is isolated from ground using an inductor through which cooling water flows.

28. A laser as in claim 1 wherein said pulse power system comprises a first charging capacitor bank and a first pulse compression circuit for providing electrical pulses to said first pair of electrodes and a second charging capacitor bank and a second pulse compression circuit for providing electrical pulses to said second pair of electrodes and a resonant charging system to charge in parallel said first and second charging capacitor banks to a precisely controlled voltage.

29. A laser as in claim 28 wherein said resonance charging system comprises a De-Qing circuit.

30. A laser as in claim 28 wherein said resonance charging system comprises a bleed circuit.

31. A laser as in claim 28 wherein said resonant charging system comprises a De-Qing circuit and a bleed circuit.

32. A laser as in claim 1 wherein said pulse power system comprises a charging system comprised of at least two power supplies arranged in parallel.

33. A laser as in claim 1 and further comprising a line narrowing unit is located downstream of said master oscillator and upstream of said power amplifier.

34. A laser as in claim 1 wherein said first discharge chamber and said second discharge chamber comprise chamber windows positioned so that the incident angles of laser beams on said windows are all greater than Brewster'"'"' angle.

35. A laser as in claim 1 and further comprising a beam steering means for steering laser beams produced in said first laser unit.

36. A laser as in claim 35 wherein said steering means comprises a means for pivoting an optical element.

37. A laser as in claim 35 wherein said beam steering means comprises a means for adjusting the pressure in said line selection unit.

38. A laser as in claim 1 wherein said laser system comprises prism output coupler in part defining a resonant cavity for said first laser unit, said prism output coupler comprises two surfaces, a first surface oriented at a low loss angle for p-polarization and a second surface located orthogonal to laser beams from said first laser unit.

39. A laser as in claim 1 and further comprising a beam enclosure system comprising:

A) at least one beam seal said beam seals comprising a metal bellows, and

B) a purge means for purging said beam enclosure with a purge gas.

40. A laser as in claim 39 wherein said beam enclosure means comprise a flow directing means for producing purge flow transverse to laser beams produced in said second laser unit.

41. A laser as in claim 39 wherein said at least one beam seal is configured to permit easy replacement of said laser chamber.

42. A laser as in claim 39 wherein said at least one beam seal contains no elastomer, provide vibration isolation from said chamber, provide be train isolation from atmospheric gases and permit unrestricted replacement of said laser chamber without disturbance of said line selection unit.

43. A laser as in claim 39 wherein said at least one beam seal is vacuum compatible.

44. A laser as in claim 43 wherein said at least one beam seal is a plurality of beam seals and said plurality of said seals are easy sealing bellows seals configured for easy removal by hand.

45. A laser as in claim 1 wherein said measurement and control system comprises a primary beam splitter for splitting off a small percentage of output pulses from said second laser unit and an optical means for directing a portion of said small percentage to said pulse energy detector and an isolation means for isolating a volume bounded at least in part by said primary beam splitter and a window of said pulse energy detector from other portions of said measurement and control system to define an isolated region.

46. A laser as in claim 45 and further comprising a purge means for purging said isolated region with a purge gas.

47. A laser system as in claim 1 wherein said system is configured to operate either of a KrF laser system, an ArF laser system or an F₂ laser system with minor modifications.

48. A laser system as in claim 1 wherein said pulse power system comprises a master oscillator charging capacitor bank and a power amplifier charging capacitor bank and a resonant charger configured to charge both charging capacitor banks in parallel.

49. A laser as in claim 48 wherein said pulse power system comprises a power supply configured to furnish at least 2000V supply to said resonant charges.

50. A laser as in claim 1 and further comprising a gas control system for controlling F₂ concentrations in said first laser gas to control master oscillator beam parameters.

51. A laser as in claim 1 and further comprising a gas control system for controlling laser gas pressure in said first laser gas to control master oscillator beam parameters.

52. A laser as in claim 2 and further comprising a discharge timing controller for triggering discharges in said power amplifier to occur between 20 and 60 ns after discharges in said master oscillator.

53. A laser as in claim 2 and further comprising a discharge controller programmed to cause in some circumstances discharges so timed to avoid any significant output pulse energy.

54. A laser as in claim 53 wherein said controlled in said some circumstances is programmed to cause discharge in said power amplifier at least 20 ns prior to discharge in said master oscillator.

55. A laser as in claim 1 and further comprising a pulse multiplier unit for increasing duration of output pulses from said laser.

56. A laser as in claim 55 wherein pulse multiplier unit is arranged to receive said output pulse laser beam and to multiply the number of pulses per second by at least a factor of two so as to produce a single multiplier output pulse beam comprised of a larger number of pulses with substantially reduced intensity values compared with the laser output pulses, and pulse multiplier unit comprising:

(1) a first beam splitter arranged to separate a portion of said output beam, the separated portion defining a delayed portion, and the output beam defining a beam size and angular spread at said first beam splitter;

(2) a first delay path originating and terminating at said first beam splitter said first delay path comprising at least two focusing mirrors, said mirrors being arranged to focus said delayed portion at a focal point within said first delay path and to return said delayed portion to said first beam splitter with a beam size and angular spread equal to or approximately equal to the beam size and angular spread of the output beam at said first beam splitter.

57. A laser system as in claim 56 wherein said at least two focusing mirrors are spherical mirrors.

58. A laser system as in claim 56 and further comprising a second delay path comprising at least two spherical mirrors.

59. A laser system as in claim 56 wherein said first delay path comprises four focusing mirrors.

60. A laser system as in claim 59 and further comprising said second delay path created by a second beam splitter located in said first delay path.

61. A laser as in claim 56 wherein said first delay path comprises a second beam splitter and further comprising a second delay path comprising at least two focusing mirrors, said mirrors being arranged to focus said delayed portion at a focal point within said first delay path and to return said delayed portion to said first beam splitter with a beam size and angular spread equal to or approximately equal to the beam size and angular spread of the output beam at said first beam splitter.

62. A laser as in claim 56 wherein said first beam splitter is configured to direct a laser beam in at least two directions utilizing optical property of frustrated internal reflection.

63. A laser as in claim 56 wherein said first beam splitter is comprised of two transparent optical elements each element having a flat surface, said optical elements being positioned with said surfaces parallel to each other and separated by less than 200 nm.

64. A laser as in claim 56 wherein said first beam splitter is an uncoated optical element oriented at an angle with said output laser beam so as to achieve a desired reflection-transmission ratio.