III-nitride light emitting devices fabricated by substrate removal
First Claim
1. A method of making a light-emitting device, the method comprising:
- growing a III-nitride light-emitting structure on a growth substrate, the III-nitride light-emitting structure including a p-type layer, an n-type layer, and a light-emitting layer;
forming a first electrical contact on a side of the III-nitride light-emitting structure opposite the growth substrate, wherein the first electrical contact is reflective;
wafer bonding the III-nitride light-emitting structure to a host substrate;
after wafer bonding the III-nitride light-emitting structure to a host substrate, removing the growth substrate; and
after removing the growth substrate, forming a second electrical contact on a side of the III-nitride light-emitting structure exposed by removal of the growth substrate.
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Abstract
A III-nitride light-emitting structure including a p-type layer, an n-type layer, and a light emitting layer is grown on a growth substrate. The III-nitride light-emitting structure is wafer bonded to a host substrate, then the growth substrate is removed. In some embodiments, a first electrical contact and first bonding layer are formed on the III-nitride light-emitting structure. A second bonding layer is formed on the host substrate. In such embodiments, wafer bonding the III-nitride light emitting structure to the host substrate comprises bonding the first bonding layer to the second bonding layer. After the growth substrate is removed, a second electrical contact may be formed on a side of the III-nitride light-emitting device exposed by removal of the growth substrate.
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Citations
14 Claims
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1. A method of making a light-emitting device, the method comprising:
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growing a III-nitride light-emitting structure on a growth substrate, the III-nitride light-emitting structure including a p-type layer, an n-type layer, and a light-emitting layer;
forming a first electrical contact on a side of the III-nitride light-emitting structure opposite the growth substrate, wherein the first electrical contact is reflective;
wafer bonding the III-nitride light-emitting structure to a host substrate;
after wafer bonding the III-nitride light-emitting structure to a host substrate, removing the growth substrate; and
after removing the growth substrate, forming a second electrical contact on a side of the III-nitride light-emitting structure exposed by removal of the growth substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
forming a first electrical contact on a side of the III-nitride light-emitting structure opposite the growth substrate;
prior to removing the growth substrate, forming a first bonding layer on the first electrical contact; and
forming a second bonding layer on the host substrate;
wherein wafer bonding the III-nitride light-emitting structure to a host substrate comprises wafer bonding the first bonding layer to the second bonding layer.
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3. The method of claim 2 wherein at least one of the first bonding layer and second bonding layer is formed by a technique selected from a group including electron-beam evaporation, sputtering, and electroplating.
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4. The method of claim 2 wherein the first bonding layer is selected from a group including silver, nickel, aluminum, gold, and cobalt.
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5. The method of claim 1, wherein the first electrical contact is electrically connected to the p-type layer and the second electrical contact is electrically connected to the n-type layer.
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6. The method of claim 2 wherein the first electrical contact comprises silver.
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7. The method of claim 2 further comprising:
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forming a first substrate electrical contact on a first side of the host substrate; and
forming a second substrate electrical contact on a second side of the host substrate opposite the first side;
wherein the second bonding layer is deposited on the first substrate electrical contact.
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8. The method of claim 1 further comprising:
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etching mesas through the III-nitride light-emitting structure, the mesas defining individual light-emitting devices; and
singulating the host substrate to form individual light-emitting devices.
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9. The method of claim 8 wherein the mesas are etched after removing the growth substrate.
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10. The method of claim 1 wherein the host substrate is selected from a group including metals and semiconductors.
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11. The method of claim 1 wherein the host substrate is selected from a group including silicon, germanium, glass, copper, and gallium arsenide.
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12. The method of claim 1 wherein removing the growth substrate comprises removing the growth substrate by a technique selected from a group including laser melting, mechanical polishing, and etching of a sacrificial layer grown on the substrate prior to growing the III-nitride light-emitting structure.
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13. The method of claim 1 further comprising:
forming a first dielectric Bragg reflector mirror and a first electrical contact on a side of the III-nitride light-emitting structure opposite the growth substrate;
after removing the growth substrate, forming a second dielectric Bragg reflector mirror on a side light-emitting structure exposed by removal of the growth substrate.
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14. The method of claim 13 further comprising:
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etching away a portion of the second dielectric Bragg reflector mirror to expose a portion of the III-nitride light-emitting structure;
forming a second electrical contact on the portion of the III-nitride light-emitting structure exposed by etching away a portion of the second dielectric Bragg reflector mirror.
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Specification