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Method and apparatus for monitoring integrated circuit fabrication

  • US 6,807,503 B2
  • Filed: 10/02/2003
  • Issued: 10/19/2004
  • Est. Priority Date: 11/04/2002
  • Status: Active Grant
First Claim
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1. A sensor unit for sensing process parameters of a process to manufacture an integrated circuit using integrated circuit processing equipment, the sensor unit comprising:

  • a substrate having a wafer or wafer-like shape;

    a first sensor, disposed on or in the substrate, to sample a first process parameter; and

    a second sensor, disposed on or in the substrate, to sample a second process parameter, wherein the second process parameter is different from the first process parameter and the second sensor is a different type of sensor from the first sensor.

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