Pulse precursor deposition process for forming layers in semiconductor devices
First Claim
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1. A process for forming layers in electronic devices comprising the steps of:
- providing a reaction chamber, the reaction chamber comprising a cold wall chamber;
placing a semiconductor wafer in said reaction chamber;
heating said semiconductor wafer with a thermal heating device placed adjacent to said wafer to a temperature of at least about 300°
C.;
pulsing a precursor fluid into said reaction chamber, said precursor fluid forming a solid layer on said semiconductor wafer;
purging said reaction chamber by flowing an inert gas through said reaction chamber after each pulse in order to substantially remove any of said precursor fluid not converted into a solid; and
repeating the above steps a plurality of times in order to increase the thickness of the solid layer and wherein the process further comprises the step of annealing the solid layer multiple times during formation of the layer, the multiple annealing steps occurring after the reaction chamber is purged by the inert gas and prior to the next pulse of the precursor fluid, the solid layer being annealed by exposing the solid layer to thermal light energy, the light energy heating the solid layer to a temperature sufficient to anneal the layer.
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Abstract
A process for producing thin layers in electronic devices such as integrated circuit chips, is provided. The process includes the steps of injecting a precursor fluid into a thermal processing chamber containing a substrate, such as a semiconductor wafer. The precursor fluid is converted into a solid which forms a layer on the substrate. In accordance with the present invention, the precursor fluid is pulsed into the process chamber in a manner such that the fluid is completly exhausted or removed from the chamber in between each pulse. Light energy can be used in forming the solid layers.
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Citations
23 Claims
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1. A process for forming layers in electronic devices comprising the steps of:
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providing a reaction chamber, the reaction chamber comprising a cold wall chamber;
placing a semiconductor wafer in said reaction chamber;
heating said semiconductor wafer with a thermal heating device placed adjacent to said wafer to a temperature of at least about 300°
C.;
pulsing a precursor fluid into said reaction chamber, said precursor fluid forming a solid layer on said semiconductor wafer;
purging said reaction chamber by flowing an inert gas through said reaction chamber after each pulse in order to substantially remove any of said precursor fluid not converted into a solid; and
repeating the above steps a plurality of times in order to increase the thickness of the solid layer and wherein the process further comprises the step of annealing the solid layer multiple times during formation of the layer, the multiple annealing steps occurring after the reaction chamber is purged by the inert gas and prior to the next pulse of the precursor fluid, the solid layer being annealed by exposing the solid layer to thermal light energy, the light energy heating the solid layer to a temperature sufficient to anneal the layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A process for forming layers in electronic devices comprising the steps of:
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providing a reaction chamber, the reaction chamber comprising a cold wall chamber;
placing a substrate in said reaction chamber;
pulsing a precursor fluid into said reaction chamber;
exposing said precursor fluid to thermal light energy in said reaction chamber simultaneous with each pulse of the precursor fluid, the light energy causing said precursor fluid to convert into a solid layer on said substrate;
after each pulse of the precursor fluid, decreasing the amount of thermal light energy and purging the reaction chamber by flowing an inert gas through the reaction chamber, the inert gas cooling the solid layer and substantially removing any of the precursor fluid not converted into a solid; and
wherein between selected pulses of the precursor fluid and after cooling, annealing the solid layer by exposing the solid layer to thermal light energy prior to the next pulse, the light energy heating the solid layer to a temperature sufficient to anneal the layer. - View Dependent Claims (20, 21, 22, 23)
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Specification