Ion texturing methods and articles
First Claim
Patent Images
1. A method of ion texturing a noncrystalline surface of a layer of a cubic structure material, the method comprising:
- exposing the noncrystalline surface to at least two ion beams to texture the noncrystalline surface and form a biaxially textured surface of the cubic structure material, wherein the at least two ion beams impinge on the noncrystalline surface in sequence, and wherein the at least two ion beams impinge on the surface of the noncrystalline layer at a first angle relative to a perpendicular to the noncrystalline surface, the at least two ion beams being disposed relative to each other at a second angle around the perpendicular to the noncrystalline surface so that a crystal plane of the biaxially textured surface is oriented perpendicular to the biaxially textured surface.
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Abstract
Ion texturing methods and articles are disclosed.
44 Citations
168 Claims
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1. A method of ion texturing a noncrystalline surface of a layer of a cubic structure material, the method comprising:
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exposing the noncrystalline surface to at least two ion beams to texture the noncrystalline surface and form a biaxially textured surface of the cubic structure material, wherein the at least two ion beams impinge on the noncrystalline surface in sequence, and wherein the at least two ion beams impinge on the surface of the noncrystalline layer at a first angle relative to a perpendicular to the noncrystalline surface, the at least two ion beams being disposed relative to each other at a second angle around the perpendicular to the noncrystalline surface so that a crystal plane of the biaxially textured surface is oriented perpendicular to the biaxially textured surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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25. A method of ion texturing a noncrystalline surface of a layer of a material, the method comprising:
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exposing the noncrystalline surface to at least two ion beams to texture the noncrystalline surface and form a textured surface of the material, wherein the at least two ion beams impinge on the noncrystalline surface in sequence, and wherein a first ion beam of the at least two ion beams impinges on the surface at a first angle relative to the perpendicular to the noncrystalline surface, a second ion beam of the at least two ion beams impinges on the surface of the noncrystalline layer at a second angle relative to a perpendicular to the noncrystalline surface, the at least two ion beams being disposed relative to each other at a third angle so that a crystal plane of the biaxially textured surface is oriented perpendicular to the biaxially textured surface. - View Dependent Claims (26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53)
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54. A method, comprising:
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exposing a surface of a noncrystalline layer of a first material to at least two ion beams to texture the noncrystalline surface and to form a textured surface of the first material;
wherein the at least two ion beams impinge on the noncrystalline surface in sequence, and disposing a layer of a second material on the textured surface of the first material, the second material being chemically compatible with a third material selected from the group consisting of superconductors and precursors of superconductors. - View Dependent Claims (55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67)
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68. A method, comprising:
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disposing a noncrystalline layer of a second material on a surface of a first material, the second material being chemically compatible with a third material selected from the group consisting of superconductors and precursors of superconductors; and
exposing a surface of the noncrystalline layer of the second material to at least two ion beams to texture the noncrystalline surface and to form a textured surface of the second material;
wherein the at least two ion beams impinge on the noncrystalline surface in sequence. - View Dependent Claims (69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80)
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81. A system, comprising:
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a first ion beam source capable of emitting a first ion beam; and
a second ion beam source capable of emitting a second ion beam, wherein the first and second ion beam sources are positioned so that when they emit the first and second ion beams, respectively, to impinge on a surface to texture the surface, the first ion beam is disposed at a first angle relative to a perpendicular to the surface and the second ion beam is disposed at a second angle relative to the perpendicular to the surface, and the first and second ion beams are disposed relative to each other at a third angle so that a crystal plane of the textured surface is oriented perpendicular to the textured surface; and
wherein said first and second ion beam sources are configured for sequential emission of at least two said ion beams. - View Dependent Claims (82, 83, 84, 85, 86, 87, 88)
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89. A system, comprising:
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first ion beam means for emitting a first ion beam; and
second ion beam means for emitting a second ion beam, wherein the first and second ion beam means are positioned so that when they emit the first and second ion beams, respectively, to impinge on a surface to texture the surface, the first ion beam means is disposed at a first angle relative to a perpendicular to the surface and the second ion beam means is disposed at a second angle relative to the perpendicular to the surface, and the first and second ion beams are disposed relative to each other at a third angle around the perpendicular to the surface so that a crystal plane of the textured surface is oriented perpendicular to the textured surface; and
wherein said first and second ion beam sources are configured for sequential emission of at least two said ion beams. - View Dependent Claims (90, 91, 92, 93, 94, 95, 96)
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97. A method of ion texturing a noncrystalline surface of a layer of a cubic structure material, the method comprising:
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exposing the noncrystalline surface to at least two ion beams simultaneously to texture the noncrystalline surface and form a biaxially textured surface of the cubic structure material, wherein the at least two ion beams impinge on the surface of the noncrystalline layer at a first angle relative to a perpendicular to the noncrystalline surface, the at least two ion beams being disposed relative to each other at a second angle around the perpendicular to the noncrystalline surface so that a crystal plane of the biaxially textured surface is oriented perpendicular to the biaxially textured surface; and
wherein at least one said step of exposing the noncrystalline surface to said at least two ion beans is not carried out simultaneously with carrying out deposition on said surface. - View Dependent Claims (98, 99, 100, 101, 102, 103, 104, 105, 106, 107, 108, 109, 110, 111, 112, 113, 114, 115)
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116. A method of ion texturing a noncrystalline surface of a layer of a material, the method comprising:
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exposing the noncrystalline surface to at least two ion beams simultaneously to texture the noncrystalline surface and form a textured surface of the material, wherein a first ion beam of the at least two ion beams impinges on the surface at a first angle relative to the perpendicular to the noncrystalline surface, a second ion beam of the at least two ion beams impinges on the surface of the noncrystalline layer at a second angle relative to a perpendicular to the noncrystalline surface, the at least two ion beams being disposed relative to each other at a third angle so that a crystal plane of the biaxially textured surface is oriented perpendicular to the biaxially textured surface; and
wherein at least one said step of exposing the noncrystalline surface to said at least two ion beans is not carried out simultaneously with carrying out deposition on said surface. - View Dependent Claims (117, 118, 119, 120, 121, 122, 123, 124, 125, 126, 127, 128, 129, 130, 131, 132, 133, 134, 135, 136, 137, 138, 139, 140, 141, 142, 143)
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144. A method, comprising:
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exposing a surface of a noncrystalline layer of a first material to at least two ion beams simultaneously to texture the noncrystalline surface and to form a textured surface of the first material;
disposing a layer of a second material on the textured surface of the first material, the second material being chemically compatible with a third material selected from the group consisting of superconductors and precursors of superconductors;
wherein at least one said step of exposing the noncrystalline surface to said at least two ion beans is not carried out simultaneously with carrying out deposition on said surface. - View Dependent Claims (145, 146, 147, 148, 149, 150, 151, 152, 153, 154, 155, 156)
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157. A method, comprising:
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disposing a noncrystalline layer of a second material on a surface of a first material, the second material being chemically compatible with a third material selected from the group consisting of superconductors and precursors of superconductors; and
exposing a surface of the noncrystalline layer of the second material to at least two ion beams simultaneously to texture the noncrystalline surface and to form a textured surface of the second material;
wherein at least one said step of exposing the noncrystalline layer of said second material to said at least two ion beans is not carried out simultaneously with carrying out deposition on said second material. - View Dependent Claims (158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168)
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Specification