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System and method to monitor reticle heating

  • US 6,809,793 B1
  • Filed: 01/16/2002
  • Issued: 10/26/2004
  • Est. Priority Date: 01/16/2002
  • Status: Active Grant
First Claim
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1. A system for regulating substrate temperature, comprising:

  • an exposing source operative to expose a semiconductor reticle;

    a plurality of temperature sensors operative to proximally sense temperature characteristics of the semiconductor reticle, including during an exposure cycle; and

    a control system operative to receive temperature information indicative of the temperature characteristics sensed by the plurality of temperature sensors, the control system being proactively operative to control the exposing source based on the temperature information.

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