System and method to monitor reticle heating
First Claim
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1. A system for regulating substrate temperature, comprising:
- an exposing source operative to expose a semiconductor reticle;
a plurality of temperature sensors operative to proximally sense temperature characteristics of the semiconductor reticle, including during an exposure cycle; and
a control system operative to receive temperature information indicative of the temperature characteristics sensed by the plurality of temperature sensors, the control system being proactively operative to control the exposing source based on the temperature information.
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Abstract
A system and method are disclosed which enable temperature of a substrate, such as mask or reticle, to be monitored and/or regulated. One or more temperature sensors are associated with the substrate to sense substrate temperature during exposure by an exposing source. The sensed temperature is used to control one or more process parameters of the exposure to help maintain the substrate at or below a desired temperature.
45 Citations
22 Claims
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1. A system for regulating substrate temperature, comprising:
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an exposing source operative to expose a semiconductor reticle;
a plurality of temperature sensors operative to proximally sense temperature characteristics of the semiconductor reticle, including during an exposure cycle; and
a control system operative to receive temperature information indicative of the temperature characteristics sensed by the plurality of temperature sensors, the control system being proactively operative to control the exposing source based on the temperature information. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A system for regulating temperature a reticle of during exposure, comprising:
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an exposing source spaced apart from and oriented to emit radiation during an exposure cycle having an exposure time period;
a plurality of temperature sensors associated with the semiconductor reticle and operative to proximally sense temperature of the semiconductor reticle and provide a temperature signal indicative thereof, including during an exposure cycle; and
a control system proactively operative to discern a temperature condition of the semiconductor reticle based on the temperature signal, the control system storing data indicative of the temperature condition during at least some of the exposure cycles, the control system employing the stored temperature condition data and the discerned temperature condition of the semiconductor reticle to control the exposure time period. - View Dependent Claims (11, 12, 13, 14)
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15. A system for regulating substrate temperature, comprising:
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means for proximally sensing a plurality of temperatures of a semiconductor reticle and for providing temperature information indicative thereof, including during an exposure cycle;
means for exposing the semiconductor reticle with radiation; and
control means for proactively controlling operation of the means for exposing based on the temperature information provided by the means for sensing temperature. - View Dependent Claims (16, 17, 18, 19)
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20. A method for regulating substrate temperature, comprising:
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exposing a semiconductor reticle with radiation;
sensing a plurality of proximal temperatures of the semiconductor reticle and providing temperature information indicative of the sensed temperature, including during an exposure cycle; and
controlling the exposing in a subsequent exposure cycle proactively based on the temperature information associated with at least one of current and previous exposure cycles. - View Dependent Claims (21, 22)
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Specification