Properties of structure-formers for self-cleaning surfaces, and the production of the same

• US 6,811,856 B2
• Filed: 04/12/2002
• Issued: 11/02/2004
• Est. Priority Date: 04/12/2001
• Status: Expired due to Fees

• Current Assignee: Evonik Degussa GmbH
• Original Assignee: Creavis Gesellschaft Fuer Technologie Und Innovation Mbh
• Inventors: Oles, Markus, Nun, Edwin, Schleich, Bernhard
• Primary Examiner(s): Watkins, III, William P.
• Application Number:
  US10/120,366
• Publication Number:
  US 20020150726A1
• Time in Patent Office: 935 Days
• Field of Search: 428/143, 428/144, 428/145, 428/147, 428/148, 428/149, 428/220, 428/323, 428/327, 428/328, 428/331, 428/332, 427/199, 427/204, 427/180
• US Class Current: 428/143
• CPC Class Codes: B05D 5/08 to obtain an anti-friction or anti-adhesive surface rendering particulate materials free-flowing in general, e.g. making them hydrophobic B01J2/30
• CPC Class Codes: B05D 5/083 involving the use of fluoropolymers
• CPC Class Codes: Y10T 428/24355 Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
• CPC Class Codes: Y10T 428/24372 Particulate matter
• CPC Class Codes: Y10T 428/2438 Coated
• CPC Class Codes: Y10T 428/24388 Silicon containing coating
• CPC Class Codes: Y10T 428/24405 Polymer or resin [e.g., natural or synthetic rubber, etc.]
• CPC Class Codes: Y10T 428/24413 Metal or metal compound
• CPC Class Codes: Y10T 428/24421 Silicon containing
• CPC Class Codes: Y10T 428/25 Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
• CPC Class Codes: Y10T 428/254 Polymeric or resinous material
• CPC Class Codes: Y10T 428/256 Heavy metal or aluminum or compound thereof
• CPC Class Codes: Y10T 428/259 Silicic material
• CPC Class Codes: Y10T 428/26 Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension

Abstract

A self-cleaning surface which has an artificial, at least partially hydrophobic, surface structure made from elevations and depressions, where the elevations and depressions are formed by particles secured to the surface, wherein the particles have a fissured structure with elevations and/or depressions in the nanometer range; a process for making such a surface; and particles having a fissured structure with elevations and/or depressions in the nanometer range.

Claims

1. A self-cleaning surface which has an at least partially hydrophobic, surface structure comprising elevations and depressions, where the elevations and depressions are formed by particles secured to the surface, wherein the particles have a fissured structure with elevations and/or depressions wherein the average height of the elevations and/or depressions of the particles is from 20 to 500 nm, and wherein the distance between the elevations and/or depressions of the particles is below 500 nm, and wherein the particles are secured to the surface by a physical method.

2. The self-cleaning surface as claimed in claim 1, wherein the particles have an average size of less than 50 μ

m.

3. The self-cleaning surface as claimed in claim 2, wherein the particles have an average size of less than 30 μ

m.

4. The self-cleaning surface as claimed in claim 1, wherein the particles comprise at least one material selected from the group consisting of silicates, doped silicates, minerals, metal oxides, fumed and precipitated silicas, polymers, metal powders and silica coated metal powders.

5. The self-cleaning surface as claimed in claim 1, wherein the particles have hydrophobic properties.

6. The self-cleaning surface as claimed in claim 1, wherein individual particles are separated from each other on the surface by from 0 to 10 particle diameters.

7. The self-cleaning polymer surface as claimed in claim 1, wherein individual particles are separated from each other on the surface by from 2 to 3 particle diameters.

8. The self-cleaning surface as claimed in claim 1, wherein the average height of the elevations and/or depressions of the particles is from 20 to 200 nm.

9. The self-cleaning surface as claimed in claim 1, wherein the distance between the elevations and/or depressions of the particles is below 200 nm.

19. The self-cleaning surface of claim 1, wherein the physical method comprises pressing the particles into the surface, or by sintering the particles to one another or sintering particles to a fine-powder carrier material.

10. A process for producing self-cleaning surfaces having an at least partially hydrophobic, surface structure, which comprises securing particles which have fissured structures with elevations and/or depressions on a surface by a physical method, wherein the average height of the elevations and/or depressions of the particles is from 20 to 500 nm, and wherein the distance between the elevations and/or depressions of the particles is below 500 nm.

11. The process as claimed in claim 10, wherein the particles comprise at least one material selected from the group consisting of silicates, doped silicates, minerals, metal oxides, fumed and precipitated silicas, polymers, metal powders and silica coated metal powders.

12. The process as claimed in claim 10, wherein the physical method comprises pressing the particles into the surface, or by sintering the particles to one another or sintering particles to a fine-powder carrier material.

13. The process as claimed in claim 10, wherein the particles have hydrophobic properties.

14. The process as claimed in claim 13, wherein the hydrophobic properties have been obtained by treatment of the particles with at least one compound selected from the group consisting of alkylsilanes, fluoroalkyl-silanes, paraffins, waxes, fatty esters, functionalized long-chain alkane derivatives, disilazanes, alkyldisilazanes, and fluoroalkane derivatives.

15. The process as claimed in claim 13, wherein the hydrophobic properties are imparted to the particles after securing the particles to the surface.

16. The process as claimed in claim 15, wherein the hydrophobic properties have been imparted by treatment of the particles with at least one compound selected from the group consisting of alkylsilanes, fluoroalkyl-silanes, paraffins, waxes, fatty esters, functionalized long-chain alkane derivatives, disilazanes, alkyldisilazanes, and fluoroalkane derivatives.

17. The process as claimed in claim 10, wherein the self-cleaning surfaces are on planar or non-planar objects.

18. The process as claimed in claim 10, wherein the self-cleaning surfaces comprise non-rigid surfaces of objects.