Plasma etching apparatus and plasma etching method
First Claim
1. A plasma processing method for processing a sample of one lot of a plurality of samples placed in a processing chamber by using plasma formed within an inner wall constituting at least a part of the processing chamber, the method comprising the steps of:
- processing the samples of the lot while changing a temperature on at least a surface of the inner wall of the processing chamber upon processing of the samples at an initial stage of the lot so that the temperature on at least the surface of the inner wall of the processing chamber is not maintained at a substantially constant temperature upon processing of the samples at the initial stage of the lot.
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Abstract
A plasma etching method for etching a sample within an etching chamber having a sidewall, an exchangeable jacket which is held inside of the sidewall, and a heating mechanism proximate to top end of the exchangeable jacket for generating heat which radiates towards an inside of the etching chamber. The plasma etching method further including a step of evacuating the etching chamber by an evacuation system, a step of supplying an etching gas into the etching chamber, a step of generating a plasma for performing etching of the sample in the etching chamber, and a step of conducting a heating operation by the heating mechanism during an initial stage of the step of generating a plasma.
69 Citations
10 Claims
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1. A plasma processing method for processing a sample of one lot of a plurality of samples placed in a processing chamber by using plasma formed within an inner wall constituting at least a part of the processing chamber, the method comprising the steps of:
processing the samples of the lot while changing a temperature on at least a surface of the inner wall of the processing chamber upon processing of the samples at an initial stage of the lot so that the temperature on at least the surface of the inner wall of the processing chamber is not maintained at a substantially constant temperature upon processing of the samples at the initial stage of the lot. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
Specification