Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same
First Claim
1. A transferring method, comprising:
- providing a substrate wherein the substrate is transparent;
forming a separation layer over the substrate;
forming a transferred layer over the separation layer;
irradiating the separation layer with light through the substrate where the transferred layer is formed to cause exfoliation; and
causing exfoliation at at least one of the separation layer and an interface between the separation layer and the substrate; and
partly cleaving the separation layer such that a part of the transferred layer is removed from the substrate and transferred to a transfer member in a given pattern.
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Accused Products
Abstract
A transferring method including providing a substrate, forming a transferred layer over the substrate, joining a transfer member to the transferred layer, and removing the transferred layer from the substrate. The transferring method further includes transferring the transferred layer to the transfer member and reusing the substrate for another transfer. The transferring method may also include providing a substrate, forming a separation layer over the substrate, forming a transferred layer over the separation layer, and partly cleaving the separation layer such that a part of the transferred layer is transferred to a transfer member in a given pattern. The transferring method may also include joining a transfer member to the transferred layer, removing the transferred layer from the substrate and transferring the transferred layer to the transfer member, these of which constitute a transfer process, the transfer process being repeatedly performed.
665 Citations
15 Claims
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1. A transferring method, comprising:
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providing a substrate wherein the substrate is transparent;
forming a separation layer over the substrate;
forming a transferred layer over the separation layer;
irradiating the separation layer with light through the substrate where the transferred layer is formed to cause exfoliation; and
causing exfoliation at at least one of the separation layer and an interface between the separation layer and the substrate; and
partly cleaving the separation layer such that a part of the transferred layer is removed from the substrate and transferred to a transfer member in a given pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method for manufacturing an active matrix substrate, comprising:
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providing a substrate wherein the substrate is transparent;
forming a separation layer over the substrate;
forming a transferred layer including a plurality of thin film transistors, above the separation layer;
irradiating the separation layer with light through the substrate where the transferred layer is formed to cause exfoliation; and
causing exfoliation at at least one of the separation layer and an interface between the separation layer and the substrate;
partly cleaving the separation layer such that a part of the transferred layer is removed from the substrate and is transferred to a transfer member in a given pattern. - View Dependent Claims (14, 15)
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Specification