Stage device and exposure apparatus

• US 6,819,404 B2
• Filed: 12/09/2002
• Issued: 11/16/2004
• Est. Priority Date: 12/01/1999
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Tanaka, Keiichi
• Primary Examiner(s): Kim, Peter B.
• Application Number:
  US10/314,128
• Publication Number:
  US 20030123041A1
• Time in Patent Office: 708 Days
• Field of Search: 355/53, 355/67, 355/77, 355/55, 355/72, 356/399, 356/400, 356/401, 250/548, 250/492.2
• US Class Current: 355/72
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/70758 Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Abstract

A method for calibrating a lithographic projection apparatus and the lithographic apparatus identify a reference position of an object table with a first detection system, and measure the reference position with a first position measuring system that cooperates with a first mirror of the object table. In addition, the reference position of the object table is identified with a second detection system, and the reference position is measured with a second position measuring system that cooperates with a second mirror of the object table. The second mirror is substantially parallel to the first mirror. Furthermore, the first and second position measuring systems are correlated using the measurements of the reference position.

Claims

1. A method for calibrating a lithographic projection apparatus comprising:

identifying a reference position of an object table with a first detection system and measuring the reference position with a first position measuring system, the first position measuring system cooperating with a first mirror of the object table;

identifying the reference position of the object table with a second detection system and measuring the reference position with a second position measuring system, the second position measuring system cooperating with a second mirror of the object table, the second mirror being substantially parallel to the first mirror; and

correlating the first and the second position measuring systems using the measurements of the reference position.

2. A method according to claim 1, wherein at least one of the first detection system and the second detection system identifies the reference position optically.

3. A method according to claim 1, wherein at least one of the first position measuring system and the second position measuring system comprises an interferometer system.

4. A lithographic projection apparatus comprising:

a radiation system to supply a projection beam of radiation;

a first object table to support patterning structure, the patterning structure constructed and arranged to pattern the projection beam according to a desired pattern;

a second object table to hold a substrate, the second object table having a first mirror, a second mirror that is substantially parallel to the first mirror, and a reference mark;

a projection system to project the patterned beam onto a target portion of the substrate;

a first position measuring system that cooperates with the first mirror to measure a position of the second object table;

a first detection system to identify the reference mark within a range of the first position measuring system;

a second position measuring system that cooperates with the second mirror to measure a position of the second object table;

a second detection system to identify the reference mark within a range of the second position measuring system; and

a processor in communication with the first and the second position measuring systems and the first and the second detection systems, the processor being configured and arranged to correlate measurements of the first and the second position measuring systems.

5. A lithographic projection apparatus according to claim 4, wherein at least one of the first detection system and the second detection system identifies the reference mark optically.

6. A lithographic projection apparatus according to claim 4, wherein at least one of the first position measuring system and the second position measuring system comprises an interferometer system.

7. A lithographic projection apparatus comprising:

an object table having a first mirror, a second mirror that is substantially parallel to the first mirror, and a reference mark;

a first optical system that detects the reference mark;

a first interferometer system that cooperates with the first mirror to measure a position of the object table;

a second optical system different from the first optical system to detect the reference mark;

a second interferometer system that cooperates with the second mirror to measure a position of the object table; and

a processor in communication with the first and the second interferometer systems and the first and the second optical systems, the processor being configured and arranged to correlate the first and second interferometer systems based on the reference mark.