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ABERRATION MEASURING APPARATUS, ABERRATION MEASURING METHOD, PROJECTION EXPOSURE APPARATUS HAVING THE SAME MEASURING APPARATUS, DEVICE MANUFACTURING METHOD USING THE SAME MEASURING METHOD, AND EXPOSURE METHOD

  • US 6,819,414 B1
  • Filed: 11/17/2000
  • Issued: 11/16/2004
  • Est. Priority Date: 05/19/1998
  • Status: Expired due to Fees
First Claim
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1. An aberration measuring apparatus comprising:

  • a converging lens disposed on the light path of light beam to converge light beam traveling through a measurement target optical system on a predetermined surface;

    an aperture stop disposed on the light path of light beam to transmit a part of the light beam;

    a moving unit connected the aperture stop to move said aperture stop within the light beam;

    a converging position detection unit disposed on the predetermined surface to detect a positional deviation of a converging position of a part of the light beams traveling through said aperture stop on the predetermined surface; and

    an arithmetic processing unit connected the converging position detection unit to calculate an aberration of said measurement target optical system on the basis of an output signal from said converging position detection unit.

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