In-line deposition processes for circuit fabrication
First Claim
1. A repositionable aperture mask comprising:
- an elongated web of flexible polymeric film; and
a deposition mask pattern formed in the film, wherein the deposition mask pattern defines deposition apertures that extend through the film that define at least a portion of an integrated circuit.
1 Assignment
0 Petitions
Accused Products
Abstract
In one embodiment, the invention is directed to aperture mask deposition techniques using aperture mask patterns formed in one or more elongated webs of flexible film. The techniques involve sequentially depositing material through mask patterns formed in the film to define layers, or portions of layers, of the circuit. A deposition substrate can also be formed from an elongated web, and the deposition substrate web can be fed through a series of deposition stations. Each deposition station may have an elongated web formed with aperture mask patterns. The elongated web of mask patterns feeds in a direction perpendicular to the deposition substrate web. In this manner, the circuit creation process can be performed in-line. Moreover, the process can be automated to reduce human error and increase throughput.
-
Citations
42 Claims
-
1. A repositionable aperture mask comprising:
-
an elongated web of flexible polymeric film; and
a deposition mask pattern formed in the film, wherein the deposition mask pattern defines deposition apertures that extend through the film that define at least a portion of an integrated circuit. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
-
-
20. A system comprising:
-
a first web of flexible film;
a second web of flexible polymeric film, wherein the second web of film defines a deposition mask pattern that defines at least a portion of an integrated circuit;
a drive mechanism that moves at least one of the first and second webs relative to the other of the first and second webs; and
a deposition unit that deposit onto the first web of film through the deposition mask pattern defined by the second web of film. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
-
-
35. A system comprising:
-
a first web of film;
a second web of polymeric film, wherein the second web of film is formed with a number of deposition mask patterns;
a third web polymeric film, wherein the third web of film is formed with a number of deposition mask patterns;
a first deposition chamber, wherein the first and second webs of film feed past one another inside the first deposition chamber such that material can be deposited onto the first web of film through a deposition mask pattern of the second web of film; and
a second deposition chamber, wherein the first and third webs of film feed past one another inside the second deposition chamber such that material can be deposited onto the first web of film through a deposition mask pattern of the third web or film.
-
-
36. A stretching apparatus for aligning a deposition mask pattern with a substrate, wherein the deposition mask pattern is formed in a first web of polymeric film, the apparatus comprising:
-
a first stretching mechanism to stretch the first web of film to align the deposition mask pattern formed in the first web of film with the substrate. - View Dependent Claims (37, 38, 39)
a second stretching mechanism to stretch the second web of film to align the deposition mask pattern formed in the first web of film relative to the substrate.
-
-
40. A system comprising:
-
a first web of film;
a second web of polymeric film, wherein the second web of film is formed with a number of deposition mask patterns;
a first stretching mechanism to stretch the first web of film in a down-web direction;
a second stretching mechanism to stretch the second web of film in a down-web direction, wherein the down-web direction of the second web of film is different from the down-web direction of the first web or film, wherein stretching the first and second webs of film aligns a deposition mask pattern of the second web of film with the first web of film for a deposition process; and
a deposition unit to deposit material through the deposition mask patterns onto the first web of film. - View Dependent Claims (41)
-
-
42. A system comprising:
-
a first web of film;
a second web of polymeric film, wherein the second web of film is formed with a number of deposition mask patterns;
a first stretching mechanism to stretch the first web of film in a cross-web direction;
a second stretching mechanism to stretch the second web of film in a cross-web direction, wherein the cross-web direction of the second web of film is different from the cross-web direction of the first web of film, wherein stretching the first and second webs of film aligns a deposition mask pattern of the second web of film with the first web of film for a deposition process; and
a deposition unit to deposit material through the deposition mask patterns onto the first web of film.
-
Specification