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Fault classification in a plasma process chamber

  • US 6,826,489 B2
  • Filed: 02/14/2002
  • Issued: 11/30/2004
  • Est. Priority Date: 02/14/2002
  • Status: Expired due to Fees
First Claim
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1. A method of fault classification in a plasma process chamber powered by an RF source, comprising the steps of:

  • (a) running a plurality of baseline processes of different types on the chamber, (b) in respect of each said baseline process, determining the magnitudes of a plurality of Fourier components of delivered RF power and storing the magnitudes as reference data for that baseline process, and (c) when a fault is to be classified, repeating more than one of the said baseline process types according to a predetermined decision tree to classify the fault by comparing the current magnitudes of the said Fourier components with the corresponding reference data.

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