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Enhanced collimated deposition

  • US 6,827,824 B1
  • Filed: 04/12/1996
  • Issued: 12/07/2004
  • Est. Priority Date: 04/12/1996
  • Status: Expired due to Fees
First Claim
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1. An apparatus for film deposition comprising:

  • a deposition chamber;

    a substrate support within the deposition chamber;

    a source of target particles;

    a plasma generator creating a plasma for initially ionizing the target particles that accelerates the target particles along a distribution of trajectories;

    a secondary ionization zone within said deposition chamber between the source and the substrate, the secondary ionization zone comprised of at least one plane of optical energy to promote ionization of the target particles; and

    a magnetic field generator creating a magnetic field between the secondary ionization zone and the substrate support accelerating the ionized target particles along a substantially collimated trajectory perpendicular to the substrate support.

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