Deep-well lithography process for forming micro-electro-mechanical structures

• US 6,827,866 B1
• Filed: 12/21/2001
• Issued: 12/07/2004
• Est. Priority Date: 05/24/2000
• Status: Expired due to Term

• Current Assignee: II-VI Delaware, Inc. (Coherent Corp.)
• Original Assignee: Active Optical Networks, Inc.
• Inventors: Novotny, Vlad J.
• Primary Examiner(s): Norton, Nadine G.
• Assistant Examiner(s): Ahmed, Shamim
• Application Number:
  US10/027,882
• Time in Patent Office: 1,082 Days
• Field of Search: 216/2, 216/11, 216/41, 216/24, 430/22, 385/18, 438/690
• US Class Current: 216/2
• CPC Class Codes: G02B 6/32 having lens focusing means positioned between opposed fibre ends with lens being an integral part of the single fibre end G02B6/262
• CPC Class Codes: G02B 6/3512 the optical element being reflective, e.g. mirror
• CPC Class Codes: G02B 6/3526 the optical element being a lens
• CPC Class Codes: G02B 6/3528 the optical element being a prism
• CPC Class Codes: G02B 6/3532 the optical element being a wavelength independent filter or having spatially dependent transmission properties, e.g. neutral filter or neutral density wedge substrate with plurality of density filters
• CPC Class Codes: G02B 6/3534 the optical element being diffractive, i.e. a grating
• CPC Class Codes: G02B 6/357 Electrostatic force electrostatic forces controlling reflecting elements in general G02B26/0841
• CPC Class Codes: G02B 6/3584 constructional details of an associated actuator having a MEMS construction, i.e. constructed using semiconductor technology such as etching MEMS per se B81B, B81C

Abstract

Described is a photolithography “deep-well lithography” process for forming Micro-Electro-Mechanical Systems (MEMS) structures. The process differs from conventional lithography in that the surface being patterned is not the uppermost surface, but is instead the bottom of a “well” defined beneath the uppermost surface. The focal plane of the photolithography equipment is offset from the uppermost surface as appropriate to account for the depth of the well in which the pattern is to be formed. The bottom of the well is then patterned to produce a desired structure.

Claims

1. A photolithographic method of patterning a first material layer disposed beneath a second material layer, the second material layer being of a thickness and having a first surface in contact with the first material layer and a second surface, the method comprising in the following order:

a. forming a first mask over the second surface of the second material layer, wherein the first mask leaves portions of the second surface exposed;

b. etching the second material layer in the exposed portions down to the first material layer;

c. focusing a photolithographic image on the second surface of the second material layer;

d. adjusting the focus of the photolithographic image by an offset equal to the thickness of the second material layer; and

e. forming a second mask over the first material layer.

2. The method of claim 1, wherein the first material layer is an insulator.

3. The method of claim 1, wherein the second material layer is a semiconductor layer.

4. The method of claim 1, wherein focusing the photolithographic image on the second surface of the second material layer takes place before forming the first mask.

5. The method of claim 1, further comprising etching the first material layer through the second mask.

6. The method of claim 5, wherein etching the first material layer exposes a third material layer.

7. The method of claim 6, wherein the etched first material layer forms a third mask, the method further comprising etching the third material layer through the third mask.

8. The method of claim 7, wherein etching the third material layer exposes a forth material layer.

9. The method of claim 1, wherein the second material layer comprises a plurality of sub-layers.

10. The method of claim 9, wherein at least one of the sub-layers comprises a semiconductor.

11. A photolithographic process sequence for manufacturing MEMS structures from a first material layer of a first material thickness disposed under a second material layer of a second material thickness, the sequence comprising in the following order:

a. focusing a first photolithographic image on the second material layer;

b. forming a first mask over the second material layer, wherein the first mask leaves portions of the second material layer exposed, the first photolithographic image defining the first mask;

c. etching through the second material layer in the exposed portions of the second material layer;

d. focusing a second photolithographic image on the second material layer;

e. defocusing the second photolithographic image by an offset substantially equal to the second material thickness;

f. forming a second mask over the first material layer, the second photolithographic image defining the second mask, wherein the second mask leaves portions of the first material layer exposed; and

g. etching the exposed portions of the first material layer.

12. The process sequence of claim 11, wherein a third material layer is disposed between the first material layer and the second material layer, and wherein the second mask comprises portions of the third material layer.

13. The process sequence of claim 12, wherein the third material layer comprises silicon dioxide.

14. The process sequence of claim 13, wherein etching the exposed portions of the first material layer removes less than all of the exposed portion of the first material layer;

wherein the portions exposed by the second mask form a raised pattern defined by recessed areas formed in the exposed portions.

15. The process sequence of claim 14, further comprising:

a. forming a third mask over a first portion of the raised pattern, leaving a second portion of the raised pattern and the recessed areas exposed; and

b. etching the second portion of the raised pattern and recessed areas of the first material layer to remove substantially all of the first material layer in the recessed areas, leaving the pattern.

16. The process sequence of claim 11, wherein the first material layer comprises a semiconductor.

17. The process sequence of claim 15, wherein forming the third mask comprises focusing a third photolithographic image on the second material layer.

18. The process sequence of claim 17, further comprising defocusing the third photolithographic image by a second offset.

19. The process sequence of claim 12, wherein the third material layer is an etch-stop layer for the etching of the second material layer.