Contacting scheme for large and small area semiconductor light emitting flip chip devices

• US 6,828,596 B2
• Filed: 06/13/2002
• Issued: 12/07/2004
• Est. Priority Date: 06/13/2002
• Status: Expired due to Term

• Current Assignee: Lumileds LLC (Apollo Global Management, Inc.)
• Original Assignee: Lumileds Lighting US LLC (Apollo Global Management, Inc.)
• Inventors: Bhat, Jerome C., Steigerwald, Daniel A., Ludowise, Michael J.
• Primary Examiner(s): BAUMEISTER, BRADLEY W
• Application Number:
  US10/172,311
• Publication Number:
  US 20030230754A1
• Time in Patent Office: 908 Days
• Field of Search: 257/88, 257/91, 257/93, 257/99, 313/505, 438/34, 438/42, 438/46, 438/47
• US Class Current: 257/99
• CPC Class Codes: H01L 2224/48247 connecting the wire to a bond pad of the item
• CPC Class Codes: H01L 33/08 with a plurality of light emitting regions, e.g. laterally discontinuous light emitting layer or photoluminescent region integrated within the semiconductor body H01L27/15 takes precedence
• CPC Class Codes: H01L 33/20 with a particular shape, e.g. curved or truncated substrate
• CPC Class Codes: H01L 33/382 the electrode extending partially in or entirely through the semiconductor body
• CPC Class Codes: H01L 33/486 adapted for surface mounting

Abstract

In accordance with the invention, a light emitting device includes a substrate, a layer of first conductivity type overlying the substrate, a light emitting layer overlying the layer of first conductivity type, and a layer of second conductivity type overlying the light emitting layer. A plurality of vias are formed in the layer of second conductivity type, down to the layer of first conductivity type. The vias may be formed by, for example, etching, ion implantation, or selective growth of the layer of second conductivity type. A set of first contacts electrically contacts the layer of first conductivity type through the vias. A second contact electrically contacts the layer of second conductivity type. In some embodiments, the area of the second contact is at least 75% of the area of the device. In some embodiments, the vias are between 2 and 100 microns wide and spaced between 5 and 1000 microns apart.

Claims

1. A light emitting device comprising:

a substrate;

a layer of first conductivity type overlying the substrate;

a light emitting layer overlying the layer of first conductivity type;

a layer of second conductivity type overlying the light emitting layer;

a plurality of vias formed in the layer of second conductivity type, the plurality of vias extending to the layer of first conductivity type;

a plurality of first contacts electrically contacting the layer of first conductivity type through the plurality of vias; and

at least one second contact electrically contacting the layer of second conductivity type.

wherein the at least one second contact surrounds at least one of the plurality of first contacts.

2. The light emitting device of claim 1 wherein the layer of first conductivity type and the layer of second conductivity type comprise gallium and nitrogen.

3. The light emitting device of claim 1 wherein the layer of first conductivity type and the layer of second conductivity type comprise aluminum and phosphorus.

4. The light emitting device of claim 1 wherein each of the plurality of vias has a width ranging from about 2 μ

m to about 100 μ

m.

5. The light emitting device of claim 1 wherein each of the plurality of vias has a width ranging from about 10 μ

m to about 50 μ

m.

6. The light emitting device of claim 1 wherein each of the plurality of vias is located bctween about 5 μ

m to about 1000 μ

m from another via.

7. The light emitting device of claim 1 wherein each of the plurality of vias is located between about 50 μ

m to about 250 μ

m from another via.

8. The light emitting device of claim 1 wherein tbe plurality of vias are formed in an arrangement selected from the group consisting of rectangular, hexagonal, rhombohedral, face-centered cubic, and arbitrary.

9. The light emitting device of claim 1 further comprising:

a first insulating layer formed over the plurality of first contacts and the second contact;

a first plurality of openings in the first insulating layer, the first plurality of openings being aligned with the plurality of vias; and

a plurality of interconnects formed over the first insulating layer, the plurality of interconnects connecting the plurality of first contacts.

10. The light emitting device of claim 9 further comprising:

a second insulating layer formed over the first insulating layer and the plurality of interconnects;

at least one first opening in the second insulating layer, the first opening being located on a first portion of the device and being aligned with at least a portion of the second contact; and

at least one second opening in the second insulating layer, the second opening being located on a second portion of the device and being aligned with at least a portion of the plurality of interconnects and the plurality of vias.

11. The light emitting device of claim 10 further comprising:

a first submount connection overlying the first portion of the device; and

a second submount connection overlying the second portion of the device.

12. The light emitting device of claim 11 further comprising:

a submount connected to the first submount connection and the second submount connection;

a plurality of leads connected to the submount; and

a lens underlying the submount.

13. The light emitting device of claim 12 further comprising:

a heat sink disposed between the leads and the submount.

14. The light emitting device of claim 11 further comprising:

a board connected to the first submount connection and the second submount connection, wherein the board comprises a trace coupled to one of the first submount connection and the second submount connection.

15. The light emitting device of claim 1 further comprising an insulating layer formed between the layer of second conductivity type and the plurality of first contacts.

16. The light emitting device of claim 1 wherein the second contact comprises a material selectcd from the group consisting of Ag, Al, Au, Rh, Pt, Au:

Zn, Au;

Be, and Pd.

17. The light emitting device of claim 1 wherein at least one of the first contacts comprises a material selected from the group consisting of Au:

Te, Au;

Sn, Au;

Ge, Ag, Al, Pt, Rh, and Pd.

18. The light emitting device of claim 1 wherein an area of the second contact comprises at least 75% of an area of the device.

19. The light enntting device of claim 1 further comprising a wavelength converting layer underlying at least a portion of the substrate.

20. The light emitting device of claim 1 wherein the device has an area weighted reflectivity greater than about 0.65.

21. The light emitting device of claim 1 further comprising a ring electrically contacting the layer of first conductivity type, wherein the ring surrounds the light emitting layer.

22. The light emitting device of claim 21 wherein the ring is electrically connected to the plurality of first contacts.

23. A method of forming a light emitting device, the method comprising:

providing a substrate;

forming a layer of first conductivity type overlying the substrate;

forming an active region overlying the layer of first conductivity type;

forming a layer of second conductivity type overlying the active region;

forming a plurality of vias in the layer of second conductivity type, the plurality of vias contacting the layer of first conductivity type;

forming a plurality of first contacts, the plurality of first contacts contacting the layer of first conductivity type through the vias; and

forming a second contact on the layer of second conductivity types;

wherein the second contact surrounds at least one of the plurality of first contacts.

24. The method of claim 23 wherein forming a plurality of vias comprises etching away portions of the layer of second conductivity type.

25. The method of claim 24 wherein etching comprises using a reactive ion etch.

26. The method of claim 23 wherein forming a plurality of vias comprises implanting ions of the first conductivity type in portions of the layer of second conductivity type.

27. The method of claim 23 wherein depositing a layer of second conductivity type and forming a plurality of vias comprise selectively growing at least one layer of second conductivity type over portions of the layer of first conductivity type.

28. The method of claim 23 wherein forming a plurality of vias comprises diffusing atomic species of the first conductivity type in portions of the layer of second conductivity type.