Ultraviolet and vacuum ultraviolet antireflection substrate
First Claim
1. An ultraviolet and vacuum ultraviolet antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a trilayer antireflection film comprising a third layer, a second layer and a first layer formed on at least one side of the substrate in this order from the substrate side, wherein the center wavelength λ
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0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection, the refractive index ns of the substrate at the wavelength of λ
0, the refractive index n3 of the third layer at the wavelength of λ
0, the physical thickness d3 of the third layer, the refractive index n2 of the second layer at the wavelength of λ
0, the physical thickness d2 of the second layer, the refractive index n1 of the first layer at the wavelength of λ
0, and the physical thickness d1 of the first layer satisfy the following conditions (1) to (4);
(1) n1, n3<
ns and n1, n3<
n2, (2) 0<
n1d1≦
0.47λ
0, (3) 0.14λ
0≦
n3d3≦
0.33λ
0, and (4) 0.16λ
0≦
n2d2≦
0.38λ
0,
0.64λ
0≦
n2d2≦
0.86λ
0, or
1.13λ
0≦
n2d2≦
1.35λ
0.
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Accused Products
Abstract
An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength λ0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate.
22 Citations
11 Claims
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1. An ultraviolet and vacuum ultraviolet antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a trilayer antireflection film comprising a third layer, a second layer and a first layer formed on at least one side of the substrate in this order from the substrate side, wherein the center wavelength λ
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0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection, the refractive index ns of the substrate at the wavelength of λ
0, the refractive index n3 of the third layer at the wavelength of λ
0, the physical thickness d3 of the third layer, the refractive index n2 of the second layer at the wavelength of λ
0, the physical thickness d2 of the second layer, the refractive index n1 of the first layer at the wavelength of λ
0, and the physical thickness d1 of the first layer satisfy the following conditions (1) to (4);(1) n1, n3<
ns and n1, n3<
n2,(2) 0<
n1d1≦
0.47λ
0,(3) 0.14λ
0≦
n3d3≦
0.33λ
0, and(4) 0.16λ
0≦
n2d2≦
0.38λ
0,
0.64λ
0≦
n2d2≦
0.86λ
0, or
1.13λ
0≦
n2d2≦
1.35λ
0.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection, the refractive index ns of the substrate at the wavelength of λ
Specification
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- Resources
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Current AssigneeAsahi Glass Company, Limited (AGC, Inc.)
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Original AssigneeAsahi Glass Company, Limited (AGC, Inc.)
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InventorsTakaki, Satoru, Kikugawa, Shinya, Okada, Kaname
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Primary Examiner(s)SIKDER, MOHAMMAD YUNUS
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Application NumberUS10/456,688Publication NumberTime in Patent Office547 DaysField of Search359/359-361, 359/356-358, 359/586US Class Current359/359CPC Class CodesG02B 1/11 Anti-reflection coatingsG02B 1/115 MultilayersG03F 1/46 Antireflective coatingsG03F 1/50 Mask blanks not covered by ...G03F 1/62 Pellicles, e.g. pellicle as...G03F 7/70958 Optical materials or coatin...G03F 7/70983 Optical system protection, ...
