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MASK DATA CORRECTION APPARATUS, FOURIER TRANSFORMATION APPARATUS, UP SAMPLING APPARATUS, DOWN SAMPLING APPARATUS, METHOD OF MANUFACTURING TRANSFER MASK, AND METHOD OF MANUFACTURING DEVICE HAVING PATTERN STRUCTURE

  • US 6,831,997 B2
  • Filed: 04/09/2001
  • Issued: 12/14/2004
  • Est. Priority Date: 07/14/2000
  • Status: Expired due to Term
First Claim
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1. A mask data correction apparatus in which, based on (1) a layout data defining a shape of base elements of a graphic having a hierarchical structure, (2) said hierarchical structure, and (3) a manufacturing process condition, a mask data expressing a pattern form of a transfer mask used in said manufacturing process is created in such a manner as to suppress a distortion expected in said manufacturing process, said mask data correction apparatus comprising:

  • a Fourier transformation part configured to obtain Fourier images of said base elements by performing Fourier transformation of said base elements;

    a synthesizing part configured to obtain a Fourier image of said graphic by synthesizing said Fourier images of said base elements in Fourier space, based on said hierarchical structure;

    a spatial filter part configured to subject said Fourier image of said graphic to spatial filter processing corresponding to said distortion;

    an inverse Fourier transformation part configured to subject said Fourier image after said spatial filter processing to an inverse Fourier transformation, thereby to obtain the inverse Fourier image reflecting said distortion;

    a graphic transformation part configured to transform said inverse Fourier image into an output graphic; and

    a graphic correction part configured to correct said graphic defined by said layout data in such a direction as to suppress said distortion by comparing said output graphic outputted from said graphic transformation part with said graphic defined by said layout data, and to output a result as said mask data.

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