Article having photocatalytic activity

• US 6,833,089 B1
• Filed: 08/02/2000
• Issued: 12/21/2004
• Est. Priority Date: 08/05/1999
• Status: Expired due to Fees

• Current Assignee: Nippon Sheet Glass Company Limited
• Original Assignee: Nippon Sheet Glass Company Limited
• Inventors: Tada, Hiroaki, Kawahara, Tetsuro, Mori, Kenji, Inomata, Hiroyuki, Kijima, Yoshifumi, Doushita, Kazuhiro, Ogino, Etsuo
• Primary Examiner(s): Hess, B. Hamilton
• Assistant Examiner(s): FERGUSON, LAWRENCE D
• Application Number:
  US09/630,777
• Time in Patent Office: 1,602 Days
• Field of Search: 428/212, 428/426, 428/702, 428/704, 428/213, 430/531, 252/520.2, 252/518.1, 502/236, 502/240, 502/242
• US Class Current: 252/520.2
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 2217/71 Photocatalytic coatings
• CPC Class Codes: Y10T 428/24942 including components having same physical characteristic in differing degree
• CPC Class Codes: Y10T 428/2495 Thickness [relative or absolute]

Abstract

A surface of a glass plate is coated with a first n-type semiconductor film which is a 50 nm-thick niobium oxide film as a primer layer. The primer layer is coated with a 250 nm-thick photocatalyst film comprising titanium oxide. Thus, an article having a photocatalytically active surface is obtained. The two coating films can be formed by sputtering. The first n-type semiconductor film as the primer layer is selected so as to have a larger energy band gap than the titanium oxide. Due to this constitution, more holes are generated near the film surface. This article can be free from the problem of conventional titanium oxide films having photocatalytic activity that it is difficult to generate many surface holes contributing to photocatalytic activity, because electrons and holes generated by charge separation recombine within the film, making it impossible to effectively heighten catalytic activity.

Claims

1. An article having photocatalytic activity which comprises a substrate, a first n-type semiconductor film as a primer layer formed over a surface of the substrate, and a photocatalyst film made of an n-type semiconductor and formed on the primer layer, said first n-type semiconductor film as the primer layer (i) having an energy band gap larger than that of said photocatalyst film and (ii) being an oxide semiconductor film consisting of at least one metal oxide selected from the group consisting of niobium oxide and zirconium oxide.

2. The article having photocatalytic activity as claimed in claim 1, wherein the photocatalyst film is an oxide semiconductor film comprising titanium oxide.

3. The article having photocatalytic activity as claimed in claim 1, wherein the primer layer has a thickness of 5 nm or larger.

4. The article having photocatalytic activity as claimed in claim 1, wherein the photocatalyst film has a thickness of 30 to 2,000 nm.

5. The article having photocatalytic activity as claimed in claim 1, wherein the substrate is a transparent glass plate.

6. The article having photocatalytic activity as claimed in claim 1, which has a hydrophilic film formed on the surface of the photocatalyst film.

7. An article having photocatalytic activity which comprises a substrate, a first n-type semiconductor film as a primer layer formed over a surface of the substrate, and a photocatalyst film made of an n-type semiconductor and formed on the primer layer,

said first n-type semiconductor film as the primer layer (i) having an energy band gap larger than that of said photocatalyst film and (ii) being an oxide semiconductor film consisting of at least one metal oxide selected from the group consisting of niobium oxide and zirconium oxide,

wherein the substrate is a glass transparent plate, and

said article having, interposed between the glass plate and the primer layer, an alkali diffusion preventive film which serves to prevent any alkali ingredient contained in the glass from diffusing into the photocatalyst film.

8. The article having photocatalytic activity as claimed in claim 7, which has a hydrophilic film formed on the surface of the photocatalyst film.

9. An article having photocatalytic activity which comprises a substrate, a first n-type semiconductor film as a primer layer formed over a surface of the substrate, and a photocatalyst film made of an n-type semiconductor and formed on the primer layer, said first n-type semiconductor film as the primer layer (i) having an energy band gap larger than that of said photocatalyst film and (ii) being an oxide semiconductor film consisting of niobium oxide or niobium oxide and zirconium oxide.